Gigaphoton Inc., a lithography light source manufacturer, announced today that it has successfully achieved continuous operation of 140W EUV light source at 50 percent duty cycle on its prototype laser-produced plasma (LPP) light sources for EUV lithography scanners. It is widely believed that 140W is the output power required by EUV light sources for mass production applications.
This achievement was a result of further advancements in key technologies developed by Gigaphoton, such as Droplet Generators capable of producing tin (Sn) droplets smaller than 20 μm in diameter, the single-wavelength, solid-state pre-pulse laser and main pulse CO2 laser, and the debris mitigation technology using high-output superconducting magnets and Sn etching. The achievement of 140W continuous operation output at 50 percent duty cycle symbolizes that the industry is close to its final stages in realizing mass production-capable EUV scanners. Gigaphoton remains committed to further continuing its R&D efforts and aims to achieve 250W output by the end of 2015.
“The achievement of continuous operation, 140W output at 50 percent duty cycle, with our EUV light source proves we are very close to achieving high power, low cost, and stable LPP light sources required by our customers,” said Hitoshi Tomaru, President and CEO of Gigaphoton. “I believe that Gigaphoton’s expertise and efforts to develop the LPP light source will accelerate the development of EUV scanners for high-volume manufacturing. This achievement also serves to further encourage the industry to introduce EUV scanners as the next-generation lithography tools.”
Further details related to this press release will be presented at the SPIE Advanced Lithography Symposium held at the San Jose Convention Center from February 23 through 26, 2015.
This milestone was achieved as part of a program subsidized by New Energy and Industrial Technology Development Organization (NEDO).