eSilicon Corporation, an independent semiconductor design and manufacturing solutions provider, today announced the addition of two foundries — Altis Semiconductor and TSI Semiconductor — to its automated, instant online quote system for multi-project wafer (MPW) shuttles. The service, accessed through user-friendly web or smartphone interfaces, instantly generates executable MPW quotes. Typically it can take up to a week to get a quote using the traditional manual process.
eSilicon’s online MPW quote system allows users to quickly evaluate multiple prototyping options based on node, technology and package services.
“We are making three flavors of 130nm technologies — low power, RF and eFlash — available through eSilicon’s MPW quoting tool,” said Delphine Knaak, marketing manager at Altis. “Our 130nm CMOS platform provides dedicated solutions to a wide range of applications including wireless, automotive, industrial and security.”
“Our 250nm Logic, BCD and HV analog offering is a nice addition to eSilicon’s multi-project wafer quote portfolio,” said Deborah Harvey, TSI’s executive VP, worldwide foundry sales and marketing. “I believe eSilicon’s online approach will bring us together with new customers in a simple, direct way.”
“We’re delighted to add Altis and TSI to eSilicon’s online MPW program,” said Mike Gianfagna, eSilicon’s VP, marketing. “The MPW program is all about easy access and choices. Expanding the foundry list will indeed provide our customers with a significantly broader range of options.”
MPWs reduce prototype cost by up to 90 percent versus a full production mask by grouping multiple IC designs on one mask set and sharing mask costs among multiple program participants. MPWs are typically used for product prototyping, IP verification, device characterization and low-volume requirements.
eSilicon’s online MPW services are available for most nodes from TSMC at 20nm-350nm, GLOBALFOUNDRIES at 20nm-180nm, UMC at 28nm-600nm, SMIC at 40nm-180nm, Altis Semiconductor at 130nm and TSI Semiconductor at 250nm.