IBM plans nano-fab keynote for Pan Pac - Small Times
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IBM plans nano-fab keynote for Pan Pac

(December 16, 2010) -- Speaker Armin W. Knoll, IBM Research, will share insights on use of nanofabrication techniques to make 3D structures during the keynote address at Pan Pacific 2011, January 18-20 in Hawaii.

Charles Bauer, Ph.D., TechLead Corporation, chairs. The keynote will be in the Mauka room on the 18th at 4:45-5:30pm. The keynote abstract is below.

"3D Nanofabrication Using Heated Probes - Towards MHZ Patterning Rates"
A. W. Knoll, P. Paul, F. Holzner, M. Despont, U. Duerig, and J. L. Hedrick, IBM Research

Abstract: A high throughput high-resolution probe based patterning method is presented using organic resists that respond to the presence of a hot tip by local material decomposition and desorption. Thereby arbitrarily shaped patterns can be written in the organic films in the form of a topographic relief. Fabrication of three dimensional patterns is done in a single patterning step by controlling the amount of material removal. Recent progress enables patterning rates of 400 kHz and read-back rates of >600 kHz, limited only by the mechanical response of the cantilever. Both the polymer decomposition dynamics and the mechanical stability of the setup allow scaling to higher frequencies of 1 MHz or above. The new technique offers a cost-effective and competitive alternative to high-resolution electron-beam lithography in terms of both resolution and speed.

About the speaker: Armin Knoll received a Master's degree in experimental physics from the University of Wuerzburg, Germany (1998) and the Ph.D. in Physical Chemistry from the University of Bayreuth, Germany, in 2004. After a postdoctoral fellowship with the University of Basel for 15 months (2003-2004) he joined the Advanced Media Concepts group of the Millipede project (2005-2006) at the IBM Zurich Research Laboratory as a Visiting scientist. Armin Knoll joined Science & Technology department in April 2006. His fields of expertise are in scanning probe microscopy, two photon polymerization lithography, block-copolymer self assembly and polymer physics. He is responsible for the probe-based Nanofabrication project.

Learn more about the conference at

Also read: IBM: 3D nanopatterning goes sub-15nm, beats e-beam litho

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