Wafer Polishing
Wafer Polishing news and technical articles from Solid State Technology Magazine. Search Wafer Polishing latest and archived news and articles
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Enabling 22nm litho with double-sided silicon wafer polishing process
… advanced polishing technology for its MicroLine AC 1500-P ³ and AC 2000-P ³ ( Figure 1 ) double-sided silicon wafer polishing (DSP) systems that will meet the lithography requirements for semiconductor device manufacturing at 22nm and beyond …
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CAMP CMP, Day 3: CMP fangs, dual-purpose slurry injector, "true CMP" HB-LED wafer polishing ; karaoke time!
Techcet's Michael A. Fury continues his observations from this year's International Symposium on CMP at Clarkson U. in New York. Highlights from Day 3: Horrifying CMP "fangs," dissolved gases in megasonics, a dual-purpose slurry injector, the usefulness of CMP levelers, CVD Co as a Cu barrier, ...
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300-mm Wafer Polishing /Lapping
300-mm wafer polishing /lapping The AC 2000 double-side lapping and polishing tool is designed for high-throughput, precision machining of 300 …
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DuPont sells CMP JV interests to Air Products
… up for the semiconductor and wafer polishing industries. Terms of the agreement ..... slurries for the semiconductor and wafer polishing , with a portfolio of colloidal ..... copper CMP, tungsten CMP and wafer polishing applications. It operates applications …
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Field report: CMP users group
… his current incarnation, "Advances in optical polishing abrasives and slurries." Semiconductor CMP and silicon wafer polishing , after all, had their roots in optical polishing. Slurry recycling is common, slurry filtration is not, and chemistries …
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ICPT 2012: Five themes summarizing CMP work and progress
… that received the most attention. One was applying conditioning techniques to the double-sided polishers used in wafer polishing . Jorn Kanzow from Peter Wolters reported that conditioning provided edge control for the double-sided polishing …
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Gap measurement tech from Novellus' Peter Wolters benefits from sensor, algorithm advances
… measurement technology for double-side silicon prime wafer polishing (DSP) . New high-resolution sensors and software ..... Enabling 22nm litho with double-sided silicon wafer polishing process Subscribe to Solid State Technology/Advanced …
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Undiluted slurry data improves CMP metrics
… for CMP slurry to perform consistently during the wafer polishing process has resulted in a push on the part of IC manufacturers ..... intended slurry composition, but can have impact on wafer polishing affects. Figures 2 & 3 show slurry particles in the …
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World News
… memory customer. EUROPE Peter Wolters has introduced new gap measurement technology for double-side silicon prime wafer polishing . CEA-Leti is deploying EVG 's litho and packaging tools in its 300mm cleanroom for 3D technology demos and low …
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CMP metrics improved by undiluted slurry data
… need CMP slurry to perform consistently during the wafer polishing process, and to that end, they are pushing for improved ..... of the intended slurry composition, but can impact wafer polishing . Figures 2 & 3 show slurry particles in the LPC range …
