Wafer Drying
Wafer Drying news and technical articles from Solid State Technology Magazine. Search Wafer Drying latest and archived news and articles
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Imec, Lam Research improve wafer drying with test method
… have developed a quantitative evaluation method for wafer drying techniques. Silicon nano-pillar test structures with ..... the mechanisms of pattern collapse and sticking in the wafer drying step. The team recorded results with top-down scanning …
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Single-wafer wet cleaning improved by novel high-performance wafer drying
… Mertens, Katrien Marent, IMEC, Leuven, Belgium Wafer Drying SPECIAL REPORT: State-of-the-art processing overview ..... 47, March 1999. K. Wolke, et al., "Marangoni Wafer Drying Avoids Disadvantages of Spin Drying or Alcohol Rinse …
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Patents awarded for advanced wafer drying system
Patents awarded for advanced wafer drying system Fremont, CA AIO Corp. (Fremont, CA) was awarded three patents for its Sonic Fog IPA substrate drying technology, a …
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Simple wet cleaning improvements can meet new silicon surface preparation criteria
… remove all contaminants. Silicon wafer drying methods: additional challenges ..... there is evidence that silicon wafer drying methods that use IPA are creating ..... organic residue issue with IPA for wafer drying , enhancing less-effective methods …
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Northeastern Surface Prep 2010: EUV masks, CMP, solar cell texturing, nano-chopsticks
… reasons are combining to drive a sharper focus on UHP water specs and dilute chemistry processes. Watermarks formed on wafer drying can be caused by formation of silicic acid in air; drying in N 2 can reduce or eliminate this. Marangoni drying with …
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Using ultrapure steam for water-contamination control
… reduce water needs from liters per wafer to grams per wafer (1ml of water equals 1250sccm of water vapor). Existing wafer drying processes could easily be adapted to this cleaning technique and, finally, the by-products of the process could …
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Single-tank processing demonstrates immersion batch cleaning for 65nm ICs
… throughput advantage of 50-wafer batch systems and incorporating production-proven surface-tension gradient wafer - drying techniques. Pilot line tests demonstrated capabilities for low-particle HF-last cleaning, uniform thin-oxide …
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Product News
… impurities whether organic, water, nonvolatile residue, or ionic in parts cleaning baths, wet bench wafer cleaning, and wafer drying operations. The fluid is practically nontoxic and nonflammable, has zero ozone-depletion potential, and has low …
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Automated handling of ultra-thin silicon wafers
… thermal stresses across a wafer due to temperature variations. For example, one important factor is to ensure that wafer drying after wet cleaning does not cause any surface tension forces. It is also important to minimize handoffs from support …
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Jockeying for second place in wet process market: SCP Global and SEZ look to expand offerings
… head creates a viscous layer of IPA on the surface, then the water drains out and the viscous layer moves down the wafer , drying the wafer with a wicking effect. Marketing Manager Sta Tsickler says there are about 100 of the former L-Tech tools …
