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Vapor Deposition

Vapor Deposition news and technical articles from Solid State Technology Magazine. Search Vapor Deposition latest and archived news and articles

  1. Tegal+AMMS eyes growth in 3D packaging, MEMS

    Online Articles

    Mon, 8 Sep 2008

    reactive ion etch (DRIE) and plasma-enhanced chemical vapor deposition (PECVD) products is "a critical part of our growth strategy ..... reactive ion etch (DRIE) and plasma-enhanced chemical vapor deposition (PECVD) products and related IP in a $5M in cash-and

  2. India Institute of Technology purchases sp3 hot filament CVD diamond deposition tool

    Online Articles

    Tue, 24 Jun 2008

    two new orders for its Model 650 hot filament chemical vapor deposition (HFCVD) diamond reactor, including one from the India ..... on a wide variety of substrate materials. The chemical vapor deposition technology is ideal for applications such as diamond on

  3. Novellus launches new PECVD system, new PVD source at SEMICON West

    Online Articles

    Wed, 18 Jul 2007

    Systems Inc. has launched the VECTOR Extreme plasma enhanced chemical vapor deposition (PECVD) system and the INOVA NExT with HCM IONX ionized physical vapor deposition (PVD) source at SEMICON West. The Vector Extreme has a throughput

  4. Quantifying ALD technologies for high aspect ratio structures

    Magazine Articles

    Wed, 1 Aug 2007

    Chemical vapor deposition (CVD) has become an essential technique for thin film deposition ..... 2003. V.Y. Vassiliev, S.M. Repinsky, “Chemical Vapor Deposition of Thin Film Dielectrics,” Russian Chemical Reviews, 74(5), pp. 413-441

  5. First Nano ships first of its EasyTube 6000 systems for labs

    Online Articles

    Fri, 3 Aug 2007

    Equipment Corp. , has shipped its first EasyTube 6000 chemical vapor deposition system. The multi-tube EasyTube 6000 horizontal system ..... is offered with atmospheric and low- pressure chemical vapor deposition processes. In Q4 2007, First Nano plans to install an

  6. Etch and CVD process improvements via heated vacuum throttle valves

    Magazine Articles

    Fri, 1 Dec 2000

    Allen, Texas overview Metal etch and low pressure chemical vapor deposition processes are placing additional demands on established ..... Click here to enlarge image In many etching and chemical vapor deposition (CVD) wafer fabrication processes, the desired process

  7. Vapor delivery system

    Magazine Articles

    Sat, 1 May 1999

    Vapor delivery system The GS-437 for chemical vapor deposition , diffusion processes and etch operations supplies a precise flow of chemical vapor without the use of a carrier gas by controlling

  8. Safe usage of C1F3: Supply, vacuum service, and exhaust gas management

    Magazine Articles

    Mon, 1 Sep 1997

    BOC Gases, Murray Hill, New Jersey Chlorine trifluoride (ClF3) is a highly reactive process gas used in chemical vapor deposition (CVD) and diffusion furnace applications for nonplasma cleans. Relatively new to US wafer manufacturers, ClF3 is an

  9. Integrated ALD/PVD Cu barrier/seed system

    Magazine Articles

    Tue, 1 Oct 2002

    Integrated ALD/PVD Cu barrier/seed system Click here to enlarge image This integrated atomic layer deposition/physical vapor deposition (ALD/PVD) product, the Endura iCuB/S Integrated Cu Barrier/Seed system, deposits the critical barrier and seed

  10. Aviza, Trikon spark IPO buzz with proposed match

    Magazine Articles

    Mon, 28 Mar 2005

    agreed to merge to form a $160 million company combining Trikon’s plasma etch, physical- vapor deposition (PVD), and chemical- vapor deposition (CVD) systems, with Aviza’s thermal processing and ALD tools. The two firms will be

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