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<title><![CDATA[RSS for Mocvd]]></title>
<description><![CDATA[Mocvd news and technical articles from Solid State Technology Magazine. Search Mocvd latest and archived news and articles]]></description>
<link><![CDATA[http://www.electroiq.com/topics/]]></link>
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<title><![CDATA[Confronting sub-20nm front-end challenges with the “duck and weave”]]></title>
<link><![CDATA[http://www.electroiq.com/articles/sst/2013/04/confronting-sub-20nm-front-end-challenges-with-the-duck-and-weav.html]]></link>
<guid>http://www.electroiq.com/articles/sst/2013/04/confronting-sub-20nm-front-end-challenges-with-the-duck-and-weav.html</guid>
<pubDate><![CDATA[Wed, 24 Apr 2013 10:40:00 EDT]]></pubDate>
<description><![CDATA[Just as a boxer avoids a surprise shot to the head or torso by using a “duck and weave” maneuver, so to must front-end technologists confront the challenges associated with extending optical lithography while planning for EUV lithography’s eventual high-productivity solution.]]></description>
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<title><![CDATA[Critical updates on EUV, 3D transistors and 450mm manufacturing at SEMICON West 2013]]></title>
<link><![CDATA[http://www.electroiq.com/articles/sst/2013/04/critical-updates-on-euv--3d-transistors-and-450mm-manufacturing-.html]]></link>
<guid>http://www.electroiq.com/articles/sst/2013/04/critical-updates-on-euv--3d-transistors-and-450mm-manufacturing-.html</guid>
<pubDate><![CDATA[Tue, 23 Apr 2013 13:28:00 EDT]]></pubDate>
<description><![CDATA[The critical processes and technologies necessary to continue Moore’s Law are currently more uncertain than ever before in the history of advanced semiconductor manufacturing.]]></description>
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<title><![CDATA[University of Cambridge installs AIXTRON MOCVD reactor for GaN-on-Si wafers]]></title>
<link><![CDATA[http://www.electroiq.com/articles/sst/2013/04/university-of-cambridge-installs-aixtron-mocvd-reactor-for-gan-o.html]]></link>
<guid>http://www.electroiq.com/articles/sst/2013/04/university-of-cambridge-installs-aixtron-mocvd-reactor-for-gan-o.html</guid>
<pubDate><![CDATA[Thu, 18 Apr 2013 11:56:00 EDT]]></pubDate>
<description><![CDATA[AIXTRON SE today announced that the University of Cambridge has successfully commissioned another multi-wafer Close Coupled Showerhead (CCS) MOCVD reactor at its new facility at the Department of Material Science and Metallurgy. The CCS 6x2-inch system will be configured to handle single 6-inch ...]]></description>
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<title><![CDATA[Plessey is first to release GaN on silicon LEDs]]></title>
<link><![CDATA[http://www.electroiq.com/articles/sst/2013/04/plessey-is-first-to-release-gan-on-silicon-leds.html]]></link>
<guid>http://www.electroiq.com/articles/sst/2013/04/plessey-is-first-to-release-gan-on-silicon-leds.html</guid>
<pubDate><![CDATA[Mon, 08 Apr 2013 15:05:00 EDT]]></pubDate>
<description><![CDATA[Plessey today announced that samples of its Gallium Nitride (GaN) on silicon LED products are today available. These entry level products are the first LEDs manufactured on 6-inch GaN on silicon substrates to be commercially available anywhere in the world.]]></description>
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<title><![CDATA[Veeco MOCVD chosen for CEA-Leti and Aledia’s new nano-LED venture]]></title>
<link><![CDATA[http://www.electroiq.com/articles/sst/2013/04/veeco-mocvd-chosen-for-cea-leti-and-aledias-new-nano-led-venture.html]]></link>
<guid>http://www.electroiq.com/articles/sst/2013/04/veeco-mocvd-chosen-for-cea-leti-and-aledias-new-nano-led-venture.html</guid>
<pubDate><![CDATA[Wed, 03 Apr 2013 12:29:00 EDT]]></pubDate>
<description><![CDATA[Veeco Instruments Inc. announced today that CEA-Leti, a research lab based in Grenoble, France, has selected Veeco’s TurboDisc K465i Metal Organic Chemical Vapor Deposition (MOCVD) system for its program with Aledia, its nanowire-LED partner.]]></description>
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<title><![CDATA[MV launches multi-trap vacuum pump inlet for 300mm wafer fabrication process]]></title>
<link><![CDATA[http://www.electroiq.com/articles/sst/2013/03/mv-launches-multi-trip-vacuum-pump-inlet-for-300mm-wafer-fabrica.html]]></link>
<guid>http://www.electroiq.com/articles/sst/2013/03/mv-launches-multi-trip-vacuum-pump-inlet-for-300mm-wafer-fabrica.html</guid>
<pubDate><![CDATA[Tue, 19 Mar 2013 11:44:00 EDT]]></pubDate>
<description><![CDATA[MV Products has announced that their high-capacity, modular vacuum pump inlet-exhaust traps can be stacked for semiconductor wafer fabrication processes which produce a lot of heavy particulates.]]></description>
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<title><![CDATA[OneChip announces partnerships and plans to expand into the DCI and PON markets]]></title>
<link><![CDATA[http://www.electroiq.com/articles/sst/2013/03/onechip-announces-partnerships-and-plans-to-expand-into-the-dci-.html]]></link>
<guid>http://www.electroiq.com/articles/sst/2013/03/onechip-announces-partnerships-and-plans-to-expand-into-the-dci-.html</guid>
<pubDate><![CDATA[Fri, 15 Mar 2013 10:56:00 EDT]]></pubDate>
<description><![CDATA[OneChip Photonics this week revealed strategic, outsourcing plans to expand into new markets, with announcements of newly-established relationships with semiconductor foundry GCS and wafer supplier IQE. Both announcements related to OneChip’s bigger, strategic plan to expand its services into the ...]]></description>
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<title><![CDATA[AIXTRON sees signs of market stabilization in report of 2012 fiscal year]]></title>
<link><![CDATA[http://www.electroiq.com/articles/sst/2013/03/aixtron-sees-signs-of-market-stabilization-in-report-of-2012-fis.html]]></link>
<guid>http://www.electroiq.com/articles/sst/2013/03/aixtron-sees-signs-of-market-stabilization-in-report-of-2012-fis.html</guid>
<pubDate><![CDATA[Thu, 07 Mar 2013 14:50:00 EST]]></pubDate>
<description><![CDATA[Management expects demand for MOCVD production equipment to potentially improve as demand for LEDs increases later in the current year.]]></description>
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<title><![CDATA[FOREPI signs multiple order for AIXTRON production system]]></title>
<link><![CDATA[http://www.electroiq.com/articles/sst/2013/02/forepi-signs-multiple-order-for-aixtron-production-system.html]]></link>
<guid>http://www.electroiq.com/articles/sst/2013/02/forepi-signs-multiple-order-for-aixtron-production-system.html</guid>
<pubDate><![CDATA[Tue, 26 Feb 2013 15:18:00 EST]]></pubDate>
<description><![CDATA[AIXTRON SE today announced that, in the third quarter of 2012, long-term customer Formosa Epitaxy Inc. (FOREPI), Taiwan, placed a new order for multiple CRIUS II-L MOCVD production systems in a 69x2-inch configuration. All systems will be used for the manufacturing of ultra-high brightness (UHB) ...]]></description>
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<title><![CDATA[GT Advanced Technologies to produce low-cost GaN template substrates with Soitec]]></title>
<link><![CDATA[http://www.electroiq.com/articles/sst/2013/02/gt-advanced-technologies-announces-development-agreement-with-so.html]]></link>
<guid>http://www.electroiq.com/articles/sst/2013/02/gt-advanced-technologies-announces-development-agreement-with-so.html</guid>
<pubDate><![CDATA[Mon, 25 Feb 2013 11:25:00 EST]]></pubDate>
<description><![CDATA[HVPE system expected to lower the cost of LED production and accelerate adoption in commercial and residential lighting.]]></description>
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