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<title><![CDATA[RSS for 3d Metrology]]></title>
<description><![CDATA[3d Metrology news and technical articles from Solid State Technology Magazine. Search 3d Metrology latest and archived news and articles]]></description>
<link><![CDATA[http://www.electroiq.com/topics/]]></link>
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<title><![CDATA[High-volume MEMS manufacturer adds FOGALE metrology tool]]></title>
<link><![CDATA[http://www.electroiq.com/articles/stm/2012/06/high-volume-mems-manufacturer-adds-fogale-metrology-tool.html]]></link>
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<pubDate><![CDATA[Wed, 20 Jun 2012 15:52:00 EDT]]></pubDate>
<description><![CDATA[A major high-volume MEMS maker has purchased a FOGALE nanotech T-MAP DUAL 3D 200A for its US manufacturing facility. The tool will be equipped with 2 load ports and will be fully automated.]]></description>
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<title><![CDATA[TSV moves to "real engineering," but reliability data needed]]></title>
<link><![CDATA[http://www.electroiq.com/articles/ap/2011/july/tsv-moves-to-real-engineering-but-reliability-data-needed.html]]></link>
<guid>http://www.electroiq.com/articles/ap/2011/july/tsv-moves-to-real-engineering-but-reliability-data-needed.html</guid>
<pubDate><![CDATA[Mon, 11 Jul 2011 09:16:00 EDT]]></pubDate>
<description><![CDATA[Jan Vardaman, president and founder of TechSearch International, summarizes highlights from her SEMICON West presentation on TSVs, speaking to RDL development, LED packaging, and TSV-alternative PoP.]]></description>
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<title><![CDATA[Product News]]></title>
<link><![CDATA[http://www.electroiq.com/articles/sst/print/volume-54/issue-6/departments/product-news.html]]></link>
<guid>http://www.electroiq.com/articles/sst/print/volume-54/issue-6/departments/product-news.html</guid>
<pubDate><![CDATA[Wed, 01 Jun 2011 01:00:00 EDT]]></pubDate>
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<title><![CDATA[Asian foundry inspects micro bumps with Camtek systems]]></title>
<link><![CDATA[http://www.electroiq.com/articles/ap/2011/05/asian-foundry-inspects-micro-bumps-with-camtek-systems.html]]></link>
<guid>http://www.electroiq.com/articles/ap/2011/05/asian-foundry-inspects-micro-bumps-with-camtek-systems.html</guid>
<pubDate><![CDATA[Thu, 26 May 2011 13:50:40 EDT]]></pubDate>
<description><![CDATA[Camtek Ltd. (NASDAQ and TASE: CAMT) received repeat automatic optical inspection (AOI) orders from an Asia-based foundry doing advanced micro bump inspection and metrology. Challenges arise in measuring such small bumps used in advanced packages, including efficiently handling huge amounts of data.]]></description>
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<title><![CDATA[KLAC packaged IC inspector ICOS CI T620]]></title>
<link><![CDATA[http://www.electroiq.com/articles/ap/2011/03/klac-packaged-ic-inspector-icos-ci-t620.html]]></link>
<guid>http://www.electroiq.com/articles/ap/2011/03/klac-packaged-ic-inspector-icos-ci-t620.html</guid>
<pubDate><![CDATA[Tue, 15 Mar 2011 10:35:10 EDT]]></pubDate>
<description><![CDATA[KLA-Tencor Corporation (Nasdaq: KLAC) introduced the ICOS CI-T620, a high-performance component inspector system for tape and reel. The CI-T620 system has dual tapers working sequentially with minimal operator intervention to increase units per hour.]]></description>
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<title><![CDATA[Rudolph-Asia-OSAT-collab-on-2D-defect-inspection-3D-solder-bump-TSV-depth-metrology-for-stacked-die]]></title>
<link><![CDATA[http://www.electroiq.com/articles/ap/2010/11/rudolph-asia-osat-collab-on-2d-defect-inspection-3d-solder-bump-.html]]></link>
<guid>http://www.electroiq.com/articles/ap/2010/11/rudolph-asia-osat-collab-on-2d-defect-inspection-3d-solder-bump-.html</guid>
<pubDate><![CDATA[Tue, 30 Nov 2010 14:16:00 EST]]></pubDate>
<description><![CDATA[Rudolph Technologies Inc. (RTEC) is partnering with a major outsourced semiconductor assembly and test (OSAT) services manufacturer to provide its inspection and metrology capability in the development of stacked packaging processes. The process uses silicon interposer technology, sometimes ...]]></description>
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<title><![CDATA[GE-intros-CT-system-for-3D-metrology-and-analysis]]></title>
<link><![CDATA[http://www.electroiq.com/articles/ap/2010/11/ge-intros-ct-system-for-3d-metrology-and-analysis-.html]]></link>
<guid>http://www.electroiq.com/articles/ap/2010/11/ge-intros-ct-system-for-3d-metrology-and-analysis-.html</guid>
<pubDate><![CDATA[Mon, 29 Nov 2010 15:30:40 EST]]></pubDate>
<description><![CDATA[The phoenix nanotom m, from GE´s Inspection Technologies business, has been developed for high resolution and high precision X-ray computed tomography (CT) in non-destructive 3D analysis and 3D metrology.]]></description>
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<title><![CDATA[Lasertec joins SEMATECH 3D packaging research, installs 300mm TSV IR etch metrology tool]]></title>
<link><![CDATA[http://www.electroiq.com/articles/ap/2010/07/lasertec-joins-sematech.html]]></link>
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<pubDate><![CDATA[Thu, 08 Jul 2010 16:35:50 EDT]]></pubDate>
<description><![CDATA[Lasertec joined SEMATECH’s 3D Interconnect program to develop robust, cost-effective process metrology technology solutions for readying high-volume via-mid through silicon via (TSV) manufacturing. This article includes a video interview with SEMATECH about the partnership.]]></description>
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<title><![CDATA[Technologists Investigate Challenges for 3D Interconnect Metrology]]></title>
<link><![CDATA[http://www.electroiq.com/articles/ap/2009/07/technologists-investigate-challenges-for-3d-interconnect-metrology.html]]></link>
<guid>http://www.electroiq.com/articles/ap/2009/07/technologists-investigate-challenges-for-3d-interconnect-metrology.html</guid>
<pubDate><![CDATA[Wed, 01 Jul 2009 16:07:00 EDT]]></pubDate>
<description><![CDATA[July 1, 2009 -- To gain a better understanding of how new and existing wafer metrology technologies can be used, modified, or enhanced to measure and improve 3D interconnect processes, SEMATECH will host a workshop dedicated to 3D interconnect metrology on July 15 in conjunction with SEMICON West ...]]></description>
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<title><![CDATA[IITC 2009: Innovation in copper contacts, 3D, metrology]]></title>
<link><![CDATA[http://www.electroiq.com/articles/sst/print/volume-52/issue-6/departments/tech-news/iitc-2009-innovation-in-copper-contacts-3d-metrology.html]]></link>
<guid>http://www.electroiq.com/articles/sst/print/volume-52/issue-6/departments/tech-news/iitc-2009-innovation-in-copper-contacts-3d-metrology.html</guid>
<pubDate><![CDATA[Mon, 01 Jun 2009 01:06:00 EDT]]></pubDate>
<description><![CDATA[In its first foray outside of the US, IITC 2009 (June 1-3) took place in Sapporo, Japan, attended by some 600 scientists, engineers, exhibitors, and other interconnect professionals.]]></description>
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