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<title><![CDATA[RSS for Production Tool]]></title>
<description><![CDATA[Production Tool news and technical articles from Solid State Technology Magazine. Search Production Tool latest and archived news and articles]]></description>
<link><![CDATA[http://www.electroiq.com/topics/]]></link>
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<title><![CDATA[EV Group rolls out EVG120 processing system]]></title>
<link><![CDATA[http://www.electroiq.com/articles/sst/2013/05/ev-group-rolls-out-evg120-processing-system.html]]></link>
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<pubDate><![CDATA[Tue, 07 May 2013 10:42:00 EDT]]></pubDate>
<description><![CDATA[EV Group (EVG), a supplier of wafer bonding and lithography equipment for the MEMS, nanotechnology and semiconductor markets, today introduced the latest version of its EVG120 automated resist processing system.]]></description>
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<title><![CDATA[GlobalFoundries 2.5 / 3D at 20nm]]></title>
<link><![CDATA[http://www.electroiq.com/articles/sst/print/volume-56/issue-3/columns/packaging/globalfoundries-2-5-3d-at-20nm.html]]></link>
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<pubDate><![CDATA[Wed, 01 May 2013 01:00:00 EDT]]></pubDate>
<description><![CDATA[A year ago, GlobalFoundries (GF) CTO Bartlett announced the installation of TSV production tools for the company's 20nm technology platform and announced that "the first full flow silicon with TSVs was expected to start running at Fab 8 (Saratoga, NY) in Q3 2012 with mass production expected in ...]]></description>
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<title><![CDATA[Laser debonding enables advanced thin wafer processing]]></title>
<link><![CDATA[http://www.electroiq.com/articles/sst/print/volume-56/issue-1/features/3d-integration/laser-debonding-enables-advanced-thin.html]]></link>
<guid>http://www.electroiq.com/articles/sst/print/volume-56/issue-1/features/3d-integration/laser-debonding-enables-advanced-thin.html</guid>
<pubDate><![CDATA[Tue, 01 Jan 2013 01:00:00 EST]]></pubDate>
<description><![CDATA[An economically viable method for delivering throughput in fab equipment. Thomas Uhrmann, EV Group, St. Florian, Austria, and Ralph Delmdahl, Coherent GmbH, Göttingen, Germany]]></description>
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<title><![CDATA[European consortia, ASML, supplier network plan for 450mm transition]]></title>
<link><![CDATA[http://www.electroiq.com/articles/sst/2012/10/european-consortia-asml-supplier-network-plan-for-450mm-transition.html]]></link>
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<pubDate><![CDATA[Thu, 18 Oct 2012 07:00:00 EDT]]></pubDate>
<description><![CDATA[At SEMICON Europa, European government representatives, consortia, and suppliers discussed programs to support and participate in the 450mm wafer-size transition -- including a comprehensive presentation from ASML about its roadmap for 450mm EUV platforms.]]></description>
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<title><![CDATA[Jordan Valley’s 300/450mm NVD defect tool]]></title>
<link><![CDATA[http://www.electroiq.com/topics/m/video/59993648/jordan-valley-s-300-450mm-nvd-defect-tool.htm?]]></link>
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<pubDate><![CDATA[Thu, 26 Jul 2012 16:41:11 EDT]]></pubDate>
<description><![CDATA[Jordan Valley’s new NVD detection tools hit significant needs for 300/450mm wafers with early detection of non visual crystalline defects that lead to unexpected wafer breakage during rapid thermal anneal and result in down time and yield loss. Early detection saves tool down time and enables early ...]]></description>
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<title><![CDATA[Intel takes 15% stake in ASML, part of EUV, 450mm development push]]></title>
<link><![CDATA[http://www.electroiq.com/articles/sst/2012/07/intel-takes-15-stake-in-asml-part-of-euv-450mm-development.html]]></link>
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<pubDate><![CDATA[Tue, 10 Jul 2012 00:32:00 EDT]]></pubDate>
<description><![CDATA[ASML established a program to enable its largest customers to make minority equity investments in the semiconductor manufacturing tool maker. The program includes commitments to fund ASML's R&D spending, accelerating development of EUVL and 450mm technology for 2015-2020 timeframe.]]></description>
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<title><![CDATA[The ConFab: Turning the technology knobs for system scaling]]></title>
<link><![CDATA[http://www.electroiq.com/articles/sst/2012/06/the-confab-turningthe-technology-knobs-for-system-scaling.html]]></link>
<guid>http://www.electroiq.com/articles/sst/2012/06/the-confab-turningthe-technology-knobs-for-system-scaling.html</guid>
<pubDate><![CDATA[Tue, 05 Jun 2012 09:45:00 EDT]]></pubDate>
<description><![CDATA[Chip scaling will go on for the foreseeable future, enabling new product with more compute power, more memory, faster on-chip communication. That was one of the conclusions put forth by imec’s An Steegen, speaking on technology trends at The ConFab 2012.]]></description>
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<title><![CDATA[EUV lithography readiness: ConFab presentation preview]]></title>
<link><![CDATA[http://www.electroiq.com/articles/sst/2012/05/euv-lithography-readiness-confab-preview.html]]></link>
<guid>http://www.electroiq.com/articles/sst/2012/05/euv-lithography-readiness-confab-preview.html</guid>
<pubDate><![CDATA[Mon, 21 May 2012 16:30:00 EDT]]></pubDate>
<description><![CDATA[Stefan Wurm, director of lithography, SEMATECH will present “EUV Lithography Manufacturing Introduction: Infrastructure Readiness” in the session Technology Trends in Semiconductor Manufacturing at The ConFab 2012, June 3-6 in Las Vegas.]]></description>
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<title><![CDATA[GLOBALFOUNDRIES installs TSV fab tools for 20nm stacked die]]></title>
<link><![CDATA[http://www.electroiq.com/articles/ap/2012/04/globalfoundries-installs-tsv-fab-tools-for-20nm-stacked-die.html]]></link>
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<pubDate><![CDATA[Thu, 26 Apr 2012 14:36:00 EDT]]></pubDate>
<description><![CDATA[At its Fab 8, GLOBALFOUNDRIES is installing a special set of production tools to create TSV in 20nm wafers. 3D die stacking of leading-edge chips will enable mobile and consumer electronics.]]></description>
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<title><![CDATA[MOCVD and MBE epitaxy trends for compound semiconductors]]></title>
<link><![CDATA[http://www.electroiq.com/articles/sst/2012/04/mocvd-and-mbe-epitaxy-trends-for-compound-semiconductors.html]]></link>
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<pubDate><![CDATA[Fri, 20 Apr 2012 16:55:00 EDT]]></pubDate>
<description><![CDATA[The corresponding combined revenue opportunity for MBE and MOCVD is estimated to be around US $6.1 billion for the 2012-2020 periods, shows Yole Développement.]]></description>
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