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<title><![CDATA[RSS for Wafer Holder]]></title>
<description><![CDATA[Wafer Holder news and technical articles from Solid State Technology Magazine. Search Wafer Holder latest and archived news and articles]]></description>
<link><![CDATA[http://www.electroiq.com/topics/]]></link>
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<title><![CDATA[SEMICON West 2012 exhibits preview: Wafer processing and handling]]></title>
<link><![CDATA[http://www.electroiq.com/articles/sst/2012/06/semicon-west-2012-exhibit-preview-wafer-processing-and-handling.html]]></link>
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<pubDate><![CDATA[Mon, 18 Jun 2012 17:38:00 EDT]]></pubDate>
<description><![CDATA[Some of the new and flagship wafer fab products and supporting facility products, like vacuum valves, that will be on the show floor at SEMICON West, from ion implant to MOCVD traps and gas blenders.]]></description>
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<title><![CDATA[Copper BEOL solutions for advanced memory]]></title>
<link><![CDATA[http://www.electroiq.com/articles/sst/print/volume-52/issue-5/features/cover-article/copper-beol-solutions-for-advanced-memory.html]]></link>
<guid>http://www.electroiq.com/articles/sst/print/volume-52/issue-5/features/cover-article/copper-beol-solutions-for-advanced-memory.html</guid>
<pubDate><![CDATA[Fri, 01 May 2009 01:05:00 EDT]]></pubDate>
<description><![CDATA[While most copper back-end-of-line (BEOL) memory applications today utilize a single damascene layer of copper for the bitline, there are growing applications that utilize multiple copper layers and dual damascene.]]></description>
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<title><![CDATA[Using existing production tools for low-cost thin wafer handling]]></title>
<link><![CDATA[http://www.electroiq.com/articles/sst/print/volume-51/issue-4/departments/contamination-control/using-existing-production-tools-for-low-cost-thin-wafer-handling.html]]></link>
<guid>http://www.electroiq.com/articles/sst/print/volume-51/issue-4/departments/contamination-control/using-existing-production-tools-for-low-cost-thin-wafer-handling.html</guid>
<pubDate><![CDATA[Tue, 01 Apr 2008 01:04:00 EDT]]></pubDate>
<description><![CDATA[In 2003, NXP CAEN opened a new pilot line dedicated to innovative solutions in system-in-a-package (SIP) on 150mm wafers.]]></description>
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<title><![CDATA[The APAs: Honoring Industry Innovation]]></title>
<link><![CDATA[http://www.electroiq.com/articles/ap/print/volume-16/issue-6/departments/advanced-packaging-awards/the-apas-honoring-industry-innovation.html]]></link>
<guid>http://www.electroiq.com/articles/ap/print/volume-16/issue-6/departments/advanced-packaging-awards/the-apas-honoring-industry-innovation.html</guid>
<pubDate><![CDATA[Wed, 01 Aug 2007 01:08:00 EDT]]></pubDate>
<description><![CDATA[In a ceremony on July 18, 2007, Advanced Packaging celebrated the 7th Annual APA awards.]]></description>
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<title><![CDATA[2007 Finalist Showcase]]></title>
<link><![CDATA[http://www.electroiq.com/articles/ap/print/volume-16/issue-5/departments/advanced-packaging-awards/2007-finalist-showcase.html]]></link>
<guid>http://www.electroiq.com/articles/ap/print/volume-16/issue-5/departments/advanced-packaging-awards/2007-finalist-showcase.html</guid>
<pubDate><![CDATA[Sun, 01 Jul 2007 01:07:00 EDT]]></pubDate>
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<title><![CDATA[In Uncharted Territory]]></title>
<link><![CDATA[http://www.electroiq.com/articles/ap/print/volume-16/issue-1/departments/advanced-packaging-road-show/in-uncharted-territory.html]]></link>
<guid>http://www.electroiq.com/articles/ap/print/volume-16/issue-1/departments/advanced-packaging-road-show/in-uncharted-territory.html</guid>
<pubDate><![CDATA[Mon, 01 Jan 2007 01:01:00 EST]]></pubDate>
<description><![CDATA[1. Touring the NEXX System facilities are, from left to right, Gail Flower, editor-in-chief; Stan Piekos, VP finance; Meredith Courtemanche, assistant editor; Arthur Keigler, VP technology; Diane Donnelly, AP national sales manager; Dick Post, CEO; and Françoise von Trapp, managing editor.]]></description>
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<title><![CDATA[Product News]]></title>
<link><![CDATA[http://www.electroiq.com/articles/sst/print/volume-49/issue-9/departments/product-news/product-news.html]]></link>
<guid>http://www.electroiq.com/articles/sst/print/volume-49/issue-9/departments/product-news/product-news.html</guid>
<pubDate><![CDATA[Fri, 01 Sep 2006 01:09:00 EDT]]></pubDate>
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<title><![CDATA[Nikon, ASML ready for "last" battle with 193nm high-NA water immersion tools]]></title>
<link><![CDATA[http://www.electroiq.com/articles/sst/2006/07/nikon-asml-ready-for-last-battle-with-193nm-high-na-water-immersion-tools.html]]></link>
<guid>http://www.electroiq.com/articles/sst/2006/07/nikon-asml-ready-for-last-battle-with-193nm-high-na-water-immersion-tools.html</guid>
<pubDate><![CDATA[Tue, 11 Jul 2006 10:07:00 EDT]]></pubDate>
<description><![CDATA[In what should be the last roundup of water-based 193nm immersion lithography systems, two of the big lithography tool vendors are coming out with their latest tools targeting 45nm (logic) and 32nm (memory) semiconductor manufacturing. Nikon's NSR-S610C ArF immersion scanner (1.30NA) is scheduled ...]]></description>
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<title><![CDATA[Advanced Packaging Awards Entry Showcase]]></title>
<link><![CDATA[http://www.electroiq.com/articles/ap/print/volume-15/issue-7/departments/advanced-packaging-awards/advanced-packaging-awards-entry-showcase.html]]></link>
<guid>http://www.electroiq.com/articles/ap/print/volume-15/issue-7/departments/advanced-packaging-awards/advanced-packaging-awards-entry-showcase.html</guid>
<pubDate><![CDATA[Sat, 01 Jul 2006 01:07:00 EDT]]></pubDate>
<description><![CDATA[3-D PACKAGING TECHNOLOGY]]></description>
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<title><![CDATA[Surface preparation prior to deposition]]></title>
<link><![CDATA[http://www.electroiq.com/articles/cr/print/volume-20/issue-7/columns/inventorrsquos-corner/surface-preparation-prior-to-deposition.html]]></link>
<guid>http://www.electroiq.com/articles/cr/print/volume-20/issue-7/columns/inventorrsquos-corner/surface-preparation-prior-to-deposition.html</guid>
<pubDate><![CDATA[Sat, 01 Jul 2006 01:07:00 EDT]]></pubDate>
<description><![CDATA[Integrated circuit design is constantly being scaled down in pursuit of faster circuit operation and lower power consumption.]]></description>
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