<?xml version="1.0" encoding="UTF-8"?>
<rss version="2.0">
<channel>
<title><![CDATA[RSS for Wet Etch]]></title>
<description><![CDATA[Wet Etch news and technical articles from Solid State Technology Magazine. Search Wet Etch latest and archived news and articles]]></description>
<link><![CDATA[http://www.electroiq.com/topics/]]></link>
<atom:link xmlns:atom="http://www.w3.org/2005/Atom" type="application/rss+xml" rel="self" href="http://www.electroiq.com/topics/urss?pageid=488339"/>
<item>
<title><![CDATA[memsstar appoints Tony McKie CEO]]></title>
<link><![CDATA[http://www.electroiq.com/articles/sst/2013/04/memsstar-appoints-tony-mckie-ceo.html]]></link>
<guid>http://www.electroiq.com/articles/sst/2013/04/memsstar-appoints-tony-mckie-ceo.html</guid>
<pubDate><![CDATA[Tue, 09 Apr 2013 14:06:00 EDT]]></pubDate>
<description><![CDATA[memsstar Limited, a provider of etch and deposition equipment and technology solutions to manufacturers of semiconductors and MEMS, today announced the appointment of Tony McKie as its new chief executive officer (CEO). McKie is tasked with capitalising on the company's experience and reputation in ...]]></description>
</item>
<item>
<title><![CDATA[SEMI adds session, extends abstract deadline for China chip conference]]></title>
<link><![CDATA[http://www.electroiq.com/articles/sst/2012/10/semi-adds-session-extends-abstract-deadline-for-china-chip-conference.html]]></link>
<guid>http://www.electroiq.com/articles/sst/2012/10/semi-adds-session-extends-abstract-deadline-for-china-chip-conference.html</guid>
<pubDate><![CDATA[Tue, 16 Oct 2012 11:13:00 EDT]]></pubDate>
<description><![CDATA[SEMI has extended the deadline to submit proposed papers to next spring's China Semiconductor Technology International Conference 2013, and added a new symposium on circuit design, system integration, and application.]]></description>
</item>
<item>
<title><![CDATA[New method monitors, catalyzes semiconductor etch in real time]]></title>
<link><![CDATA[http://www.electroiq.com/articles/sst/2012/10/new-method-monitors-catalyzes-semiconductor-etch-in-real-time.html]]></link>
<guid>http://www.electroiq.com/articles/sst/2012/10/new-method-monitors-catalyzes-semiconductor-etch-in-real-time.html</guid>
<pubDate><![CDATA[Tue, 02 Oct 2012 12:10:00 EDT]]></pubDate>
<description><![CDATA[Researchers at the U. of Illinois have devised a method to monitor a semiconductor surface as it is etched, in real time, with nanometer precision.]]></description>
</item>
<item>
<title><![CDATA[Conference Report: International Interconnect Technology Conference, IITC]]></title>
<link><![CDATA[http://www.electroiq.com/articles/sst/2012/06/conference-report-international-technology-conference-iitc.html]]></link>
<guid>http://www.electroiq.com/articles/sst/2012/06/conference-report-international-technology-conference-iitc.html</guid>
<pubDate><![CDATA[Mon, 04 Jun 2012 23:06:00 EDT]]></pubDate>
<description><![CDATA[The 15 th IITC (International Interconnect Technology Conference) opened Monday, June 4 at the Doubletree Hotel in San Jose, CA. Recurring themes this year were variations on 3D and TSV, novel systems and packaging, and back end memory. Mike Fury reports.]]></description>
</item>
<item>
<title><![CDATA[CEA-Leti unveils wide-reaching silicon research scope]]></title>
<link><![CDATA[http://www.electroiq.com/articles/sst/2012/05/cea-leti-unveils-wide-reaching-silicon-research-scope.html]]></link>
<guid>http://www.electroiq.com/articles/sst/2012/05/cea-leti-unveils-wide-reaching-silicon-research-scope.html</guid>
<pubDate><![CDATA[Wed, 02 May 2012 16:51:00 EDT]]></pubDate>
<description><![CDATA[CEA-Leti has introduced the “LETI-3S” concept, for “Silicon Specialty Solutions.” The research is oriented to start-ups, component integrators, fabless or fablite chip companies, and equipment/consumable suppliers.]]></description>
</item>
<item>
<title><![CDATA[Intel awards 9 elite suppliers in 2011]]></title>
<link><![CDATA[http://www.electroiq.com/articles/sst/2012/04/intel-awards-9-elite-suppliers-in-2011.html]]></link>
<guid>http://www.electroiq.com/articles/sst/2012/04/intel-awards-9-elite-suppliers-in-2011.html</guid>
<pubDate><![CDATA[Fri, 13 Apr 2012 10:02:00 EDT]]></pubDate>
<description><![CDATA[Intel Corporation announced 9 winners of the company's Supplier Continuous Quality Improvement (SCQI) award for outstanding commitment to quality and performance excellence.]]></description>
</item>
<item>
<title><![CDATA[Conference Report: MRS Spring 2012, Day 3]]></title>
<link><![CDATA[http://www.electroiq.com/articles/sst/2012/04/conference-report-mrs-spring-2012-day3.html]]></link>
<guid>http://www.electroiq.com/articles/sst/2012/04/conference-report-mrs-spring-2012-day3.html</guid>
<pubDate><![CDATA[Thu, 12 Apr 2012 09:34:00 EDT]]></pubDate>
<description><![CDATA[Blogger Mike Fury reports from the MRS Spring 2012 meeting in San Francisco. Highlights from the third day: leakage and TDDB in low- κ dielectrics, flexible energy storage and conversion, Mn capping layers and diffusion barriers, hard masks for Cu interconnects, nanogenerators, Cu in RF, flexible ...]]></description>
</item>
<item>
<title><![CDATA[SPTS sends dry MEMS etch tool to China research institute]]></title>
<link><![CDATA[http://www.electroiq.com/articles/stm/2012/03/spts-sends-dry-mems-etch-tool-to-china-research-institute.html]]></link>
<guid>http://www.electroiq.com/articles/stm/2012/03/spts-sends-dry-mems-etch-tool-to-china-research-institute.html</guid>
<pubDate><![CDATA[Wed, 21 Mar 2012 14:52:00 EDT]]></pubDate>
<description><![CDATA[SPTS Technologies delivered its first VHF etch system in China, installing a Primaxx Monarch 3 at the Shanghai Institute of Microsystem and Information Technology for a MEMS accelerometer development project.]]></description>
</item>
<item>
<title><![CDATA[LED PSS etch station speeds throughput with higher temps]]></title>
<link><![CDATA[http://www.electroiq.com/articles/sst/2011/11/led-pss-etch-station-speeds-throughput-with-higher-temps.html]]></link>
<guid>http://www.electroiq.com/articles/sst/2011/11/led-pss-etch-station-speeds-throughput-with-higher-temps.html</guid>
<pubDate><![CDATA[Wed, 30 Nov 2011 11:44:00 EST]]></pubDate>
<description><![CDATA[MicroTech has developed a wet process station to etch patterned sapphire substrate (PSS) wafers in a way that increases LEDs' light output and efficiency while increasing manufacturing throughput.]]></description>
</item>
<item>
<title><![CDATA[Imec, Lam Research improve wafer drying with test method]]></title>
<link><![CDATA[http://www.electroiq.com/articles/sst/2011/10/imec-lam-research-improve-wafer-drying-with-test-method.html]]></link>
<guid>http://www.electroiq.com/articles/sst/2011/10/imec-lam-research-improve-wafer-drying-with-test-method.html</guid>
<pubDate><![CDATA[Mon, 24 Oct 2011 11:28:00 EDT]]></pubDate>
<description><![CDATA[Imec and Lam Research have developed a quantitative evaluation method for wafer drying techniques. Silicon nano-pillar test structures with high aspect ratios (up to 28) demonstrate the mechanisms of pattern collapse and sticking in the wafer drying step.]]></description>
</item>
</channel>
</rss>
