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<description><![CDATA[Mfcs news and technical articles from Solid State Technology Magazine. Search Mfcs latest and archived news and articles]]></description>
<link><![CDATA[http://www.electroiq.com/topics/]]></link>
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<title><![CDATA[New MFCs mean higher yield]]></title>
<link><![CDATA[http://www.electroiq.com/articles/sst/print/volume-56/issue-3/columns/semiconductors/new-mfcs-mean-higher-yield.html]]></link>
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<pubDate><![CDATA[Wed, 01 May 2013 01:00:00 EDT]]></pubDate>
<description><![CDATA[In what might be a case of the cobbler's children finally getting new shoes, new algorithms and control technology – powered by advanced semiconductors, of course — are enabling "intelligent" real-time flow error detection in mass flow controllers (MFCs).]]></description>
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<title><![CDATA[SEMICON West 2012 exhibits preview: Lithography focus]]></title>
<link><![CDATA[http://www.electroiq.com/articles/sst/2012/06/semicon-west-exhibits-preview-lithography.html]]></link>
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<pubDate><![CDATA[Wed, 27 Jun 2012 08:00:00 EDT]]></pubDate>
<description><![CDATA[SEMICON West is taking place July 10-12 in San Francisco, CA. Following are new products for  lithography, including photoresist coaters and ashers.]]></description>
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<title><![CDATA[Product News]]></title>
<link><![CDATA[http://www.electroiq.com/articles/sst/print/volume-54/issue-7/departments/product-news.html]]></link>
<guid>http://www.electroiq.com/articles/sst/print/volume-54/issue-7/departments/product-news.html</guid>
<pubDate><![CDATA[Tue, 12 Jul 2011 15:12:00 EDT]]></pubDate>
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<title><![CDATA[Deep silicon etch from Oxford Instruments offers process flexibility]]></title>
<link><![CDATA[http://www.electroiq.com/articles/stm/2011/06/deep-silicon-etch.html]]></link>
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<pubDate><![CDATA[Mon, 06 Jun 2011 10:35:10 EDT]]></pubDate>
<description><![CDATA[Oxford Instruments debuted the PlasmaPro Estrelas100 deep silicon etch technology for the MEMS R&D and fabrication market. The tool is designed to be flexible, accomodating multiple processes without changing chamber hardware, and multiple wafer sizes for R&D-to-production ramp.]]></description>
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<title><![CDATA[Real-time-gas-flow-monitoring-improves-mass-flow-controller-performance-in-wafer-fab]]></title>
<link><![CDATA[http://www.electroiq.com/articles/sst/2011/02/real-time-gas-flow-monitoring-improves-mass-flow-controller-perf.html]]></link>
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<pubDate><![CDATA[Tue, 01 Feb 2011 01:00:00 EST]]></pubDate>
<description><![CDATA[Sanjay Yedur et al, from Pivotal Systems and J.H. Lee et al from Samsung’s R&D Equipment Engineering Team discuss the use of a real-time gas flow monitoring system that allows for in-situ flow measurements, based on a highly accurate rate of pressure drop over a known volume and temperature. Using ...]]></description>
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<title><![CDATA[Improving etch performance using in situ gas flow monitoring and control]]></title>
<link><![CDATA[http://www.electroiq.com/articles/sst/print/volume-53/issue-7/features/advanced-process_and/improving-etch_performance.html]]></link>
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<pubDate><![CDATA[Thu, 01 Jul 2010 01:00:00 EDT]]></pubDate>
<description><![CDATA[Improve etch equipment performance through in situ gas flow monitoring and control. Mukund Venkatesh, et al, Pivotal Systems; Kevin Boyd, IBM.]]></description>
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<title><![CDATA[Improving etch performance using in situ gas flow monitoring and control]]></title>
<link><![CDATA[http://www.electroiq.com/articles/sst/2010/07/improving-etch_performance.html]]></link>
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<pubDate><![CDATA[Thu, 01 Jul 2010 01:00:00 EDT]]></pubDate>
<description><![CDATA[Improve etch equipment performance through in situ gas flow monitoring and control. Mukund Venkatesh, et al, Pivotal Systems; Kevin Boyd, IBM.]]></description>
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<title><![CDATA[Product News]]></title>
<link><![CDATA[http://www.electroiq.com/articles/sst/print/volume-53/issue-6/departments/product-news.html]]></link>
<guid>http://www.electroiq.com/articles/sst/print/volume-53/issue-6/departments/product-news.html</guid>
<pubDate><![CDATA[Tue, 01 Jun 2010 01:00:00 EDT]]></pubDate>
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<title><![CDATA[Product News]]></title>
<link><![CDATA[http://www.electroiq.com/articles/sst/print/volume-51/issue-12/departments/product-news.html]]></link>
<guid>http://www.electroiq.com/articles/sst/print/volume-51/issue-12/departments/product-news.html</guid>
<pubDate><![CDATA[Mon, 01 Dec 2008 01:12:00 EST]]></pubDate>
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<title><![CDATA[New Products]]></title>
<link><![CDATA[http://www.electroiq.com/articles/stm/print/volume-8/issue-4/columns-and-departments/products/new-products.html]]></link>
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<pubDate><![CDATA[Mon, 01 Dec 2008 01:12:00 EST]]></pubDate>
<description><![CDATA[Cambridge NanoTech, a supplier of atomic layer deposition (ALD) systems for research and industry, has released the Savannah S300 system, which offers the same combination of ease of use, reliability and experimental flexibility as earlier models in a larger format.]]></description>
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