http://www.electroiq.com/articles/sst/print/volume-56/issue-2/features/reliability/insights-into-low-frequency-noise-in-high-mobility.html http://www.electroiq.com/articles/sst/2012/september/iedm-unveils-2012-program-highlights.html http://www.electroiq.com/articles/sst/2012/02/semiconductor-metrology-beyond-22nm-defect-inspection-and-review.html http://www.electroiq.com/articles/sst/2012/02/semiconductor-metrology-beyond-22nm-3d-memory-metrology.html http://www.electroiq.com/articles/sst/2012/02/semiconductor-metrology-beyond-22nm-finfet-metrology.html http://www.electroiq.com/articles/sst/2011/06/new-architectures-litho-schemes-take-the-stage-at-semicon-west.html http://www.electroiq.com/articles/sst/2011/06/imec-finfet-beat-planar-for-bigger-srams.html 128KB) SRAMs, according to new research from imec.]]> http://www.electroiq.com/articles/sst/2011/03/leveraging-ion-implant-process-characteristics-to-facilitate.html http://www.electroiq.com/articles/sst/print/volume-54/issue-3/features/cover-article/leveraging-ion-implant-process-characteristics-to-facilitate.html http://www.electroiq.com/articles/sst/2011/02/high-k-semiconductor-materials-from-a-chemical-manufacturer-pers.html