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<title><![CDATA[RSS for Nanofabrication]]></title>
<description><![CDATA[Nanofabrication news and technical articles from Solid State Technology Magazine. Search Nanofabrication latest and archived news and articles]]></description>
<link><![CDATA[http://www.electroiq.com/topics/]]></link>
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<title><![CDATA[TSMC joins]]></title>
<link><![CDATA[http://www.electroiq.com/articles/sst/2012/08/tsmc-joins-10nm-lithography-mask-writer-project.html]]></link>
<guid>http://www.electroiq.com/articles/sst/2012/08/tsmc-joins-10nm-lithography-mask-writer-project.html</guid>
<pubDate><![CDATA[Fri, 24 Aug 2012 11:20:00 EDT]]></pubDate>
<description><![CDATA[TSMC joined IMS’s multibeam mask writer development collaboration to develop an electron multi-beam mask writer for use in advanced mask lithography applications, joining founding members DNP, Intel, and Photronics.]]></description>
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<title><![CDATA[Laser nanofabrication for mass production at the nanoscale]]></title>
<link><![CDATA[http://www.electroiq.com/articles/sst/2012/08/laser-nanofabrication-for-mass-production-at-the-nanoscale.html]]></link>
<guid>http://www.electroiq.com/articles/sst/2012/08/laser-nanofabrication-for-mass-production-at-the-nanoscale.html</guid>
<pubDate><![CDATA[Fri, 10 Aug 2012 12:43:00 EDT]]></pubDate>
<description><![CDATA[Laser nanofabrication can now meet the needs of submicron and nanoscale feature size manufacturing, and can operate in air, vacuum, or liquid processes. Sister publication Industrial Laser Solutions recently published Laser nanofabrication: A route toward next-generation mass production.]]></description>
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<title><![CDATA[Guide to MEMS at SEMICON West 2012]]></title>
<link><![CDATA[http://www.electroiq.com/articles/stm/2012/06/guide-to-mems-at-semicon-west-2012.html]]></link>
<guid>http://www.electroiq.com/articles/stm/2012/06/guide-to-mems-at-semicon-west-2012.html</guid>
<pubDate><![CDATA[Thu, 28 Jun 2012 11:00:00 EDT]]></pubDate>
<description><![CDATA[Paula Doe, SEMI Emerging Markets, shares the annual guide for navigating the MEMS events at SEMICON West, July 10-12 at Moscone Center in San Francisco, CA.]]></description>
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<title><![CDATA[MEMS researchers at UToronto purchase plasma etch tool from Oxford Instruments]]></title>
<link><![CDATA[http://www.electroiq.com/articles/stm/2012/06/mems-researchers-at-utoronto-purchase-plasma-etch-tool-from-oxford-instruments.html]]></link>
<guid>http://www.electroiq.com/articles/stm/2012/06/mems-researchers-at-utoronto-purchase-plasma-etch-tool-from-oxford-instruments.html</guid>
<pubDate><![CDATA[Tue, 19 Jun 2012 15:49:00 EDT]]></pubDate>
<description><![CDATA[Plasma etch and deposition processing system maker Oxford Instruments Plasma Technology won an order for its recently launched PlasmaPro Estrelas100 deep silicon etch tool from the University of Toronto.]]></description>
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<title><![CDATA[Directed self-assembly lithography research yields contact holes on semiconductor wafer]]></title>
<link><![CDATA[http://www.electroiq.com/articles/sst/2012/05/directed-self-assembly-lithography-research-yields-contact-holes-on-semiconductor-wafer.html]]></link>
<guid>http://www.electroiq.com/articles/sst/2012/05/directed-self-assembly-lithography-research-yields-contact-holes-on-semiconductor-wafer.html</guid>
<pubDate><![CDATA[Mon, 28 May 2012 07:00:00 EDT]]></pubDate>
<description><![CDATA[Stanford University researchers, sponsored by Semiconductor Research Corporation (SRC), have created contact hole patterns for logic and memory semiconductors using a next-generation directed self-assembly (DSA) lithography process.]]></description>
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<title><![CDATA[Researchers model ion bombardment for better nanofabrication]]></title>
<link><![CDATA[http://www.electroiq.com/articles/sst/2012/05/researchers-model-ion-bombardment-for-better-nanofabrication.html]]></link>
<guid>http://www.electroiq.com/articles/sst/2012/05/researchers-model-ion-bombardment-for-better-nanofabrication.html</guid>
<pubDate><![CDATA[Tue, 22 May 2012 21:58:00 EDT]]></pubDate>
<description><![CDATA[Brown University is using supercomputer simulations to better understand the ion bombardment of metal surfaces used in manufacturing nanoelectronics.]]></description>
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<title><![CDATA[IRSC brings NanoProfessor nano-science education to southeastern US]]></title>
<link><![CDATA[http://www.electroiq.com/articles/sst/2012/05/irsc-brings-nanoprofessor-nano-science-education-to-southeastern-us.html]]></link>
<guid>http://www.electroiq.com/articles/sst/2012/05/irsc-brings-nanoprofessor-nano-science-education-to-southeastern-us.html</guid>
<pubDate><![CDATA[Tue, 22 May 2012 10:40:00 EDT]]></pubDate>
<description><![CDATA[Indian River State College in FL will be the first college in the southeastern US to offer students access to the instrumentation and curriculum provided by the NanoProfessor Nanoscience Education Program from NanoInk.]]></description>
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<title><![CDATA[UC Berkeley installs sp3 CVD diamond reactor for MEMS development]]></title>
<link><![CDATA[http://www.electroiq.com/articles/stm/2012/05/uc-berkeley-installs-sp3-cvd-diamond-reactor-for-mems-development.html]]></link>
<guid>http://www.electroiq.com/articles/stm/2012/05/uc-berkeley-installs-sp3-cvd-diamond-reactor-for-mems-development.html</guid>
<pubDate><![CDATA[Mon, 21 May 2012 15:20:00 EDT]]></pubDate>
<description><![CDATA[sp3 Diamond Technologies Inc. shipped its Model 655D series hot-filament CVD diamond reactor system to the University of California, Berkeley Marvell Nanofabrication Laboratory.]]></description>
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<title><![CDATA[UNL taps SEMI-GAS for semiconductor metrology lab’s gas needs]]></title>
<link><![CDATA[http://www.electroiq.com/articles/sst/2012/05/unl-taps-semi-gas-for-semiconductor-metrology-labs-gas-needs.html]]></link>
<guid>http://www.electroiq.com/articles/sst/2012/05/unl-taps-semi-gas-for-semiconductor-metrology-labs-gas-needs.html</guid>
<pubDate><![CDATA[Tue, 08 May 2012 15:54:00 EDT]]></pubDate>
<description><![CDATA[SEMI-GAS Systems, ultra-high-purity gas source and distribution system maker, will outfit the University of Nebraska - Lincoln’s new Nanoscience Metrology Facility. Applied Energy Systems will provide field services.]]></description>
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<title><![CDATA[Electron-beam lithography breakthroughs at Photomask Japan]]></title>
<link><![CDATA[http://www.electroiq.com/articles/sst/2012/04/electron-beam-lithography-breakthroughs-at-photomask-japan.html]]></link>
<guid>http://www.electroiq.com/articles/sst/2012/04/electron-beam-lithography-breakthroughs-at-photomask-japan.html</guid>
<pubDate><![CDATA[Mon, 16 Apr 2012 12:39:00 EDT]]></pubDate>
<description><![CDATA[The eBeam Initiative will present at Photomask Japan (PMJ), through member companies, improved photomask critical dimension uniformity (CDU) and wafer yields thanks to eBeam technologies.]]></description>
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