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  1. Organic complementary logic aim of 2 European research projects

    Article

    Fri, 4 May 2012

    methods, like roll-to-roll (R2R) nanoimprint lithography. This high-resolution patterning technique produces transistor channel lengths below 1µm, increasing organic electronics’ performance. Researchers plan to demonstrate an active

  2. Plasma etch challenges for FinFET transistors

    Article

    Tue, 10 Apr 2012

    width, height, profile) or excessive surface state density caused by plasma etch-induced damage would alter the transistor channel . FIGURE 1. The fin/STI etch requires creating both tapered isolation trenches and vertical fins, which will

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