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Surface Preparation

Surface Preparation news and technical articles from Solid State Technology Magazine. Search Surface Preparation latest and archived news and articles

  1. LED maker orders multiple fab tools from OEM Group

    Article

    Thu, 26 Apr 2012

    Spray Acid Tool (SAT) semi-automated batch surface preparation systems from OEM Group’s Cintillio product line ..... Lam AutoEtch, and Applied Materials/Semitool surface preparation equipment and processes. Its Classics equipment

  2. Defect removal using dry cryogenic aerosols

    Article

    Tue, 3 Apr 2012

    Electromechanical Society Proceedings Series, Pennington, NJ (2001). 5. J. M. Lauerhaas, 2007 SEMATECH Surface Preparation and Cleaning Conference (2007). Dr. Jeffery W. Butterbaugh is currently Chief Technologist and Director of

  1. Lam Research acquiring Novellus in all-stock deal

    Article

    Thu, 15 Dec 2011

    Lam specializes in wafer etch and single-wafer clean equipment. Novellus provides thin-film deposition and surface preparation technologies. The combined company will target semiconductor manufacturers' needs in 3D structures and scaling

  2. memsstar expands in Silicon Glen

    Article

    Tue, 4 Oct 2011

    memsstar expects the additional capacity will support its Solo, Sentry and Multi process tools for advanced etch, surface preparation and deposition processes to support MEMS R&D and volume manufacturing. The new facility layout also allows memsstar

  3. SPIE BACUS: Delayed Photomask Japan 2011 in a nutshell

    Article

    Wed, 21 Sep 2011

    Anna Tchoukoleva of GlobalFoundries presented a very interesting paper about the effect of MoSi mask absorber surface preparation on radiation durability in the wafer fab. For many years, the mask industry has worked to eliminate sulfates

  4. Avantor, SACHEM selective etch chemisty doubles as wafer cleaner

    Article

    Wed, 6 Jul 2011

    etchant was created through a joint development agreement between Avantor and SACHEM Inc., which covers specialty surface preparation and removal chemistries for thin-film wafer stacks. Avantor applied photoresist/residue removal technologies

  5. Integration and 3D-ICs driving developments in wafer bonding

    Print

    Sat, 1 Oct 2011

    and manufacturing approach that reduces design, test and manufacturing costs. Because of the improvements in surface preparation , mainly CMP and plasma activation, fusion wafer bonding has become a standardized process for heterogeneous integration

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