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Surface Etching

Surface Etching news and technical articles from Solid State Technology Magazine. Search Surface Etching latest and archived news and articles

  1. Creating phase-change memory devices with GeTe thin films

    Online Articles

    Tue, 1 Nov 2011

    precursors induce carbon contaminants in deposited films, and GeTe is no exception. Using XPS measurements with surface - etching capability, the presence of in-film carbon contamination can easily be seen ( Fig. 1 ). In this case, we found

  2. EU PVSEC: Photovoltaics getting bigger, faster, thinner, more efficient

    Online Articles

    Tue, 6 Sep 2011

    fledgling semiconductor industry. By the mid-70s, so-called 'black' cells had been developed , where the use of surface etching to add texture gave them the appearance of black velvet. Green acknowledged that some companies had indeed implemented

  1. Supply-demand dynamics call 'time' on legacy cell production technology

    Online Articles

    Thu, 9 Jul 2009

    Assisting in mask writing [30] (for subsequent metallization, secondary diffusion in selective emitters, or surface etching to texture); Localized secondary diffusion [31] (laser doping via phosphorous- or boron-contained precursor

  2. Unlocking laser tools' potential in c-Si cell fabs

    Online Articles

    Mon, 10 Aug 2009

    Assisting in mask writing [18] (for subsequent metallization, secondary diffusion in selective emitters, or surface etching to texture); Localized secondary diffusion [19] (laser doping via phosphorous- or boron-contained precursor

  3. Supply-demand dynamics call 'time' on legacy cell production technology

    Online Articles

    Thu, 9 Jul 2009

    Assisting in mask writing [30] (for subsequent metallization, secondary diffusion in selective emitters, or surface etching to texture); Localized secondary diffusion [31] (laser doping via phosphorous- or boron-contained precursor

  4. Unlocking laser tools' potential in c-Si cell fabs

    Online Articles

    Mon, 10 Aug 2009

    Assisting in mask writing [18] (for subsequent metallization, secondary diffusion in selective emitters, or surface etching to texture); Localized secondary diffusion [19] (laser doping via phosphorous- or boron-contained precursor

  5. Laser processing enables high-efficiency silicon-cell concepts

    Magazine Articles

    Sun, 1 Mar 2009

    excimer laser source has been qualified for a few years—for a different application to form a barrier for front- surface etching of poly-c-Si cells with improved light trapping. Excimer lasers have a strong track-record within laser-based

  6. Single-wafer, mixed-fluid cleaning proposed for advanced processes

    Magazine Articles

    Wed, 1 Jun 2005

    mixed-fluid jet approach to wafer cleaning that can produce up to 90 percent particle removal efficiency without surface etching . Photo courtesy of Applied Materials, Inc. Click here to enlarge image As for trends in mask cleaning, conference

  7. Single-tank processing demonstrates immersion batch cleaning for 65nm ICs

    Magazine Articles

    Mon, 1 Aug 2005

    tank design. The SC1 solution has been used for many years to remove particle contamination with a combination of surface etching and favorable pH. With the semiconductor industry moving to smaller gate linewidths, controlling the amount and

  8. Accelerating semiconductor R&D with combinatorial technology

    Magazine Articles

    Mon, 1 Oct 2007

    to aid in the transition from the 65nm to the 45nm technology node. Traditionally, pCMP cleaners have relied on surface etching to undercut and lift-off residues [3]. However, this often leads to grain-boundary decoration or selective

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