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  1. Gas-based etch enables MEMS materials flexibility, commercial reliability at Fraunhofer

    Article

    Fri, 10 Jun 2011

    gasses allow greater materials flexibility. Learn more at http://www.fraunhofer.de/en/ Also read: Deep silicon etching used for key MEMS building blocks by Trikon Technologies Subscribe to our MEMS Direct newsletter

  2. AVS Symposium 2011: A pre-show highlight reel

    Article

    Tue, 11 Oct 2011

    transistor), with 14nm/10nm fabricated prototypes MEMS and NEMS : Scallop-free TSV etching for 3D LSI; deep silicon etching with STiGer process; alternative passivation chemistries for TSVs; wafer-scale hermetic packaging for MEMS; Plasma

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