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Seed Layer

Seed Layer news and technical articles from Solid State Technology Magazine. Search Seed Layer latest and archived news and articles

  1. Briefly Speaking

    Magazine Articles

    Sun, 1 Jul 2001

    Semitool receives patent for copper seed layer enhancement Semitool (Kalispell ..... has received a patent for copper seed layer enhancement, an advancement in technology ..... based semiconductor devices. The seed layer enhancement technology can extend

  2. Combining seed layers enables the use of HAR copper interconnects

    Magazine Articles

    Sat, 1 Jul 2006

    or its atomic-layer deposition (ALD) variant- seed layer and a PVD seed layer , which enables the use of HAR interconnects. The combined seed layer provides fully continuous step coverage inside HAR

  1. Wet-process technologies for scalable through-silicon vias

    Magazine Articles

    Fri, 1 Apr 2011

    copper. An additional copper- seed layer may be needed before via filling if the ..... makes it possible to eliminate the Cu seed layer , and, as described later, sets ..... Electrografting deposition of a Cu seed layer , using a bath containing specific

  2. Conference report: IITC closes with talks from EUV to TSV

    Online Articles

    Thu, 7 Jun 2012

    SOURCE: A*STAR. Fumihiro Inoue of IMEC showed a novel seed layer process using direct electroless Cu deposition on ALD ..... was high, and conductivity was adequate to serve as a seed layer . Figure 2. Cross-sectional images of TSV after ELD-Cu

  3. Wet process technologies for scalable through silicon vias

    Online Articles

    Fri, 1 Apr 2011

    copper. An additional copper- seed layer may be needed before via filling if the ..... makes it possible to eliminate the Cu seed layer , and, as described later, sets ..... Electrografting deposition of a Cu seed layer , using a bath containing specific

  4. Conference Report: International Interconnect Technology Conference, IITC

    Online Articles

    Mon, 4 Jun 2012

    considerations. Soo-Hyun Kim of Yeungnam U (Korea) gave an invited talk on ALD Ru with organometallic precursors for copper seed layer and capacitor electrodes. Rapid nucleation was achieved using three different zero-valent Ru compounds reacting with

  5. Processing and integration of copper interconnects

    Magazine Articles

    Sun, 1 Mar 1998

    electroplating requires deposition of a thin seed - layer prior to the plating fill step. The seed - layer provides a low-resistance conductor ..... electroplating. The COO calculations for seed - layer deposition, as well as the full

  6. Conference Report: MRS Spring 2012, Day 3

    Online Articles

    Thu, 12 Apr 2012

    capacitors. It was resolved by using a seed layer of the nanoparticle alone as a surface ..... bottom-up fill requires a copper seed layer before the mechanism can initiate. This work found that a seed layer of CVD Mn 4 N (Mn amidinate with NH

  7. Novellus develops copper seed PVD process for TSV packaging

    Online Articles

    Tue, 9 Mar 2010

    method is to deposit a thicker copper seed layer to achieve sufficient sidewall coverage ..... using a 2000 angstrom thick copper seed layer . The conventional PVD approach requires an 8000 angstrom thick seed layer to achieve the same result. The

  8. Cost-effective advanced copper metallization using ECPR

    Magazine Articles

    Tue, 5 Oct 2010

    develop, barrier metal deposition, seed layer deposition, electrochemical plating ..... sequence. The deposition of a barrier / seed layer on top of a patterned photoactive ..... pre-fill, master cleaning, and seed layer etch into a single ECPR tool also eliminates

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