Plasma Etching
Plasma Etching news and technical articles from Solid State Technology Magazine. Search Plasma Etching latest and archived news and articles
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Pattern transfer into low dielectic materials by high-density plasma etching
… New York overview Directional plasma etching of low dielectric constant materials ..... constant material applications, and plasma etching of porous silica exhibits important ..... dielectric by lithographic and plasma etching techniques. The trenches are …
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Plasma Etching /Cleaning System
The PE-200-RIE Convertible, from Plasma Etch, is a convertible RIE configuration of the companies PE-200 plasma etching /cleaning system. Designed for anisotropic etching of nitrides, oxides, and polyimide, the system features a 13 …
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SEERs-based process control and plasma etching
… used in semiconductor production, particularly in plasma etching . Practical implementation is via self-excited electron ..... of ions incident to the substrate being etched. In plasma etching , this is important for simultaneous control of etch …
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In situ wafer temperature measurement during plasma etching
… Wafer temperature is one of the hidden parameters in plasma etching that has a significant impact on process results and ..... wafer temperature. Monitoring wafer temperature in plasma etching is a significant challenge, given the harsh plasma …
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Plasma Etching System
The PE-2000R roll-to-roll plasma etching system is capable of processing various types of polymeric materials with varying width, thickness and substrate composition …
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Etching: Closed-loop bias voltage control for plasma etching
… the key RF power parameters for plasma etching systems. Unfortunately, in current ..... now available for high-density plasma etching systems. Acknowledgments The ..... control of inductively coupled plasma etching equipment," Proc. SPIE, Vol …
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Controlling porous low-k damage with decoupled plasma etching
One of the key challenges in backend integration is damage to the low-k dielectric during etch/ash processes.
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April 2005 Exclusive Feature: Etch Plasma etching using an ICP etcher
Georgy K. Vinogradov, Masaharu Takeda, FOI Corp., Kanagawa, Japan Highly selective SiO 2 etching plasma processes increasingly are required in manufacturing of ultralarge scale integrated circuits, where deep etching of silicon oxide (oxide) layers involves fluorocarbon deposition. Such ...
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Plasma Etch Inc
Manufactures plasma etching equipment. Cleans organic contamination from nearly all substrates, improving coating uniformity, adhesiveness, and bond strengths. Complete system customization and contract plasma service available.
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Probing plasma/surface interactions
… California Understanding plasma-surface interactions in plasma etching , deposition, and cleaning is a prerequisite for ..... interactions. Phenomena occurring on surfaces during plasma etching , deposition, and cleaning remain among the least …
