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Plasma Etching

Plasma Etching news and technical articles from Solid State Technology Magazine. Search Plasma Etching latest and archived news and articles

  1. Plasma etch challenges for FinFET transistors

    Article

    Tue, 10 Apr 2012

    overcome transistor scaling issues [1], additional etch challenges have appeared that may require new approaches to plasma etching . Compared with planar transistors, the performance of FinFET devices will depend more on etch because the multiple

  2. BC discovers CNT's 3 growth phases during PECVD

    Article

    Mon, 3 Oct 2011

    nanotubes to an integrated circuit in order to draw away heat and efficiently cool the device. After ten minutes of plasma etching , the early stage nanotubes have been washed away and the third stage tubes begin to emerge in tall, ordered rows

  1. Graphene doping doesn't need its own step when done on the edge

    Article

    Mon, 7 Nov 2011

    be done as part of other fabrication steps such as plasma etching , and that will require us to reinvent the whole process ..... Tech. Doping treatment could also be applied using plasma etching , Brenner said. Controlling the specific atoms used

  2. SEMICON West 2011: New product roundup

    Article

    Wed, 27 Jul 2011

    thermoset polyimide material is used in structural components (e.g. insulators, isolators, and retainers) in plasma etching equipment, such as plasma enhanced chemical vapor deposition (PEVCD), and high-density plasma chemical vapor

  3. Argon increases silicon etch rate 4x

    Article

    Fri, 30 Sep 2011

    published in Microelectronic Engineering: Effect of alternating Ar and SF6/C4F8 gas flow in Si nano-structure plasma etching , L. Chen, V. Luciani, and H. Miao, Microelectronic Engineering 88, 2470-2473 (2011). Access it here

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