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Plasma deposition /etch
by combining theoretical models from photolithography simulators with the manufacturing capabilities of silane-based plasma deposition chambers. By following the three steps outlined, the design of these ARCs can be made available to any semiconductor
start-up venture that Mohanty founded in 2010 with his three-person team, is deploying laser-assisted atmospheric plasma deposition technology which offers a high-speed, cost-effective and highly scalable platform approach to the synthesis of nanostructural
Metrology (reflectometer, ellipsometer, spectroscopic ellipsometer) and Plasma Process Technology (plasma etcher, plasma deposition systems). Visit SENTECH Instruments at the 25 th EU PVSEC in Valencia, Spain, September 6-9, on booth L2/H4
Produces, Plasma deposition (PECVD), etching (RIE and ICP) and cleaning-photo resist stripping systems. Also have sputtering and evaporation systems. New and refurbished systems available. RTP equipment for R&D applications provided.
Makoto Tanaka noted the company is focusing on improved microcrystalline silicon material, for which it has developed a plasma deposition technology with what he says is 10× better throughput. The plan is to use the microcrystalline film in a tandem structure
maintenance-free and battery-free and is dedicated to metal, dielectric or poly-etch, ion implantation, sputtering, and plasma deposition . Alcatel Vacuum Technology France, Annecy, France; ph 33/45065-7777, www.adixen.com. Software suite allows
PlasmaStream's precursor polymerization and coating process is designed to be gentler than conventional plasma deposition processes which typically damage or destroy the precursor molecules, along with their functionality and
Makoto Tanaka noted the company is focusing on improved microcrystalline silicon material, for which it has developed a plasma deposition technology with what he says is 10× better throughput. The plan is to use the microcrystalline film in a tandem structure
used with silane for CVD of silicon nitride layers, used as passivation, masking, or insulating layers. It's also used for plasma deposition of fused silica glass as a low- k dielectric insulating film between adjacent metal lines.