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Photomask

Photomask news and technical articles from Solid State Technology Magazine. Search Photomask latest and archived news and articles

  1. Electron-beam lithography breakthroughs at Photomask Japan

    Article

    Mon, 16 Apr 2012

    manufacturing forum, will present at Photomask Japan (PMJ), through member companies, improved photomask critical dimension uniformity (CDU ..... technologies for lithography . Also at Photomask Japan: SII reveals photomask repair

  2. SPIE BACUS: Delayed Photomask Japan 2011 in a nutshell

    Article

    Wed, 21 Sep 2011

    parts of Japan to a virtual standstill. One casualty was Photomask Japan 2011 (PMJ), which was originally scheduled to take ..... after the horrific events. PMJ has a sister conference, SPIE Photomask Technology (known in the vernacular as BACUS), annually

  1. Photomask maker Photronics buys out Micron building

    Article

    Wed, 7 Mar 2012

    Photronics, Inc. (NASDAQ:PLAB) purchased its US nanoFab building from Micron Technology Inc., paying approximately $35 million. PLAB expects to save $5 million annually after the deal.

  2. Compugraphics expanding photomask sizes for WLP

    Article

    Fri, 19 Aug 2011

    Compugraphics International is widening its line of photomasks to include larger-area products up to 16 in 2 , responding to customer demand for wafer-level packaging and other semiconductor and optical applications.

  3. New RAVE division offers semiconductor makers custom lithography defect study

    Article

    Mon, 13 Feb 2012

    as well as custom semiconductor and photomask services such as haze generation systems ..... chemistry sciences, and research in photomask and semiconductor fields. Core offerings ..... custom services to the semiconductor and photomask industries such as haze generation systems

  4. Litho tool explores tradeoffs at 20nm and below

    Article

    Tue, 1 Nov 2011

    At the SPIE BACUS Photomask Technology conference (Sept. 19-22, Monterey, CA), D2S announced a mask-wafer double simulation accelerated workstation

  5. Toppan Photomasks grows Shanghai site, adds more advanced capabilities

    Article

    Thu, 17 Nov 2011

    manufacturing operation serving China's semiconductor industry. Costing about $20 million, the expansion will increase photomask production significantly, and enable more advanced photomasks made with feature sizes as small as 90nm. Toppan Photomasks

  6. Applied Materials EUVL mask etch system debuts with multiple installs

    Article

    Mon, 19 Sep 2011

    wavelength would be absorbed in a transmission photomask . The EUV light source wavelength is approximately ..... figure shows a comparison between a conventional photomask and an EUV photomask . Figure. Photomask sees paradigm change with

  7. Gudeng Precision designs EUV lithography pod with VICTREX material for low contamination

    Article

    Thu, 22 Mar 2012

    March 22, 2012 -- Photomask provider Gudeng Precision Industrial Co., LTD, will use VICTREX ..... enhanced Gudeng EUV pod also meets the SEMI E152 standard. The new photomask carriers are driven by increasing customer interest in moving to

  8. Model-based mask data prep using overlapping shots for 20nm devices

    Article

    Tue, 16 Aug 2011

    sufficient PW have resulted in impractical photomask write-times. In response, several ..... by inverse lithography technology," Photomask Japan 2009 , 7379-57 (2009). [3 ..... Curvilinear Assist Features ," Proc. SPIE Photomask Tech. 2010 , 7823-6. [4] . A

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