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Optical Lithography

Optical Lithography news and technical articles from Solid State Technology Magazine. Search Optical Lithography latest and archived news and articles

  1. Extending optical lithography with complementary e-beam lithography

    Article

    Mon, 11 Jul 2011

    11, 2011 - For decades, optical lithography has driven the semiconductor ..... opportunities. However, optical lithography , based on the 193nm ArF technology ..... extremely costly to pattern with optical lithography ("critical layers") are

  2. e-beam lithography precision at optical lithography speed: Complementary lithography breaks the NGL logjam

    Article

    Tue, 6 Sep 2011

    industry has long expected optical lithography to reach resolution limits ..... could be used to complement optical lithography and pattern only critical ..... work hand-in-hand with optical lithography to manufacture advanced ICs

  1. Vistec delivers electron-beam lithography system to ITME researchers in Poland

    Article

    Thu, 26 Apr 2012

    ITME) in Warsaw, Poland, for R&D on micro-optical and diffractive elements, new materials, and masks for optical lithography . The purchase decision was made as a result of a European tendering procedure. Vistec's electron-beam writer

  2. JSR joins lithography research at CEA-Leti

    Article

    Wed, 19 Oct 2011

    develop sub-20nm next-generation lithography materials and processes , focusing on pitch division in 193nm optical lithography for <20nm logic applications and on direct-write maskless lithography (ML2) technology. The specific ML2

  3. Electron-beam lithography breakthroughs at Photomask Japan

    Article

    Mon, 16 Apr 2012

    control of the shape-dependent mask pattern quality is increasingly important for leading-edge masks, with optical lithography remaining the semiconductor manufacturing technology for the foreseeable future, said Yasuki Kimura, Project

  4. Lithography challenges for leading edge 3D packaging applications

    Article

    Tue, 1 May 2012

    2008. 4. Flack, W. et. al, " Development and Characterization of a 300mm Dual-Side Alignment Stepper," Optical Lithography XX Proceedings , SPIE 6520 (2007). 5. Coleman, D. et. al, "On the Accuracy of Overlay Measurements: Tools

  5. Lithography cost-of-ownership considerations

    Article

    Mon, 27 Jun 2011

    CEBL for patterning critical layers to complement optical lithography for advanced logic and system-on-a-chip ..... delivers high throughout to complement and extend optical lithography . In addition, support infrastructure for CEBL is available

  6. A lithography-rich Day 2 at SEMICON West

    Article

    Thu, 14 Jul 2011

    materials involved. The two remaining advanced optical lithography suppliers, Nikon and ASML, both offered roadmap ..... on its source supplier. Another angle on post- optical lithography came from Mapper Lithography, which is developing

  7. A comprehensive EUV lithography model

    Article

    Sun, 1 Jan 2012

    Reilly, J. Wandell, "Stochastic simulation of resist linewidth roughness and critical dimension uniformity for optical lithography ," Jour. of Micro/Nanolithography, MEMS, and MOEMS, Vol. 9 (2010) 041212. T. Kozawa, S. Tagawa

  8. SPIE Advanced Lithography preview: eBeam Initiative roadmap

    Article

    Mon, 13 Feb 2012

    whether the semiconductor industry migrates to extreme ultra violet (EUV) lithography, or continues to use optical lithography , said Wataru Wakamiya, corporate officer and general manager of SE Business Unit, JEOL. During 2012 and beyond

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