Microlithography
Microlithography news and technical articles from Solid State Technology Magazine. Search Microlithography latest and archived news and articles
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Light sources for ArF immersion double patterning
… Immersion Lithography", Optical Microlithography XXIII, Proc of SPIE 2010 Vol 7640 ..... Management Technologies", Optical Microlithography XXIV , Proc of SPIE 2011, to be ..... Immersion Lithography", Optical Microlithography XXIV , Proc. of the SPIE 2011 …
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Evolution or revolution: the path for metrology beyond the 22nm node
… metrology utilizing scatterometry, CD-AFM, and CD-SEM." Metrology, Inspection, and Process Control for Microlithography XXV. Proceedings of the SPIE, Volume 7971, pp. 797103-797103-20 (2011). Wang, C., Choi, K., Chen …
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Scatterometry measurement for gate ADI and AEI CD of 28nm metal gates
… appeared in Metrology, Inspection, and Process Control for Microlithography XXV , ed. Christopher J. Raymond, Proc. of SPIE Vol ..... in Metrology, Inspection, and Process Control for Microlithography XVIII , edited by Richard M. Silver, Proc. of SPIE Vol …
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Semiconductor metrology beyond 22nm: 3D memory metrology
… metrology utilizing scatterometry, CD-AFM, and CD-SEM.” Metrology, Inspection, and Process Control for Microlithography XXV. Proceedings of the SPIE, Volume 7971, pp. 797103-797103-20 (2011). [3] Wang, C., Choi, K …
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Semiconductor metrology beyond 22nm: FinFET metrology
… metrology utilizing scatterometry, CD-AFM, and CD-SEM.” Metrology, Inspection, and Process Control for Microlithography XXV. Proceedings of the SPIE, Volume 7971, pp. 797103-797103-20 (2011). [3] Wang, C., Choi, K …
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Semiconductor metrology beyond 22nm: Defect inspection and review
… metrology utilizing scatterometry, CD-AFM, and CD-SEM.” Metrology, Inspection, and Process Control for Microlithography XXV. Proceedings of the SPIE, Volume 7971, pp. 797103-797103-20 (2011). [3] Wang, C., Choi, K …
