Home>Topics>Memory Devices
  1. All
  2. Article
  3. Text

Memory Devices

Memory Devices news and technical articles from Solid State Technology Magazine. Search Memory Devices latest and archived news and articles

  1. Creating phase-change memory devices with GeTe thin films

    Article

    Tue, 1 Nov 2011

    their contributions to this project. References 1. S. J. Hudgens, "The future of phase-change semiconductor memory devices ," J. Non-Crys. Solids , 354, 2748 (2008). 2. S. L. Cho et al., "Highly scalable on-axis confined

  2. SEMATECH, centrotherm’s semiconductor-fab subsidiary partner on low-temp processes

    Article

    Tue, 10 Apr 2012

    processing techniques for next-generation logic and memory devices . Continued scaling will require new materials and ..... towards usage in high performance logic transistors and memory devices in sub 14 nm advanced technology nodes. “SEMATECH provides

  1. Semiconductor metrology beyond 22nm: 3D memory metrology

    Article

    Thu, 16 Feb 2012

    for FinFETs (Part 1) and 3D memory devices , and defect detection capabilities ..... volume manufacturing. Future 3D memory devices will include multiple gate-level ..... an example of the types of 3D memory devices that will require HVM metrology

  2. Verigy tests GDDR5 at Korean memory producer

    Article

    Wed, 15 Jun 2011

    Verigy V93000 HSM6800 delivers at-speed, high-throughput, automated memory test on ultra-fast GDDR5 graphics memory devices (4Gbps+ per-pin operation). The Korean memory maker selected the V93000 HSM6800 for its test speed headroom

  3. New architectures, litho schemes take the stage at SEMICON West

    Article

    Fri, 24 Jun 2011

    The semiconductor industry is at a crossroads, with new architectures needed to continue scaling both logic and memory devices . In May, Intel surprised many by saying it will switch from a planar to a vertical FinFET transistor at the 22nm

  4. Thinfilm-PARC-bring-printed-electronics-commercialization-engagement-forward

    Article

    Mon, 4 Apr 2011

    ASA (Thinfilm) and PARC, a Xerox company, entered the next phase of their co-innovation engagement for printed memory devices . This next phase extends the engagement to prototyping the product for manufacturing readiness. PARC and Thinfilm

  5. Evolution or revolution: the path for metrology beyond the 22nm node

    Article

    Thu, 1 Mar 2012

    and metal gate undercuts. Similarly, future 3D memory devices will include multiple gate-level structures defined ..... shape [7]. This is an example of the types of 3D memory devices that will require HVM metrology. Right: Diagram

  6. NIST reveals how layered memory switches work

    Article

    Wed, 22 Feb 2012

    allow these structures to come to market sooner. Switches based on transition-metal oxides have great potential as memory devices that retain their information even when the power is turned off. One type is made by stacking four different materials

  7. Copper interconnects: Process integration of iALD TaN

    Article

    Tue, 20 Dec 2011

    December 20, 2011 -- Cu metallization is now widely used in both logic and memory devices . With the adoption of Cu metallization, metal barriers such as TaN are needed to enhance the adhesion of metal to the dielectric

  8. Semiconductor metrology beyond 22nm: FinFET metrology

    Article

    Thu, 9 Feb 2012

    SEMATECH's authors cover metrology for FinFETs and 3D memory devices , and defect detection capabilities at 22nm. The ..... and metal gate undercuts. Similarly, future 3D memory devices (Part 2 of this series) will include multiple gate

© 2012. PennWell Corporation. All Rights Reserved. PRIVACY POLICY | TERMS AND CONDITIONS