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their contributions to this project. References 1. S. J. Hudgens, "The future of phase-change semiconductor memory devices ," J. Non-Crys. Solids , 354, 2748 (2008). 2. S. L. Cho et al., "Highly scalable on-axis confined
processing techniques for next-generation logic and memory devices . Continued scaling will require new materials and ..... towards usage in high performance logic transistors and memory devices in sub 14 nm advanced technology nodes. “SEMATECH provides
for FinFETs (Part 1) and 3D memory devices , and defect detection capabilities ..... volume manufacturing. Future 3D memory devices will include multiple gate-level ..... an example of the types of 3D memory devices that will require HVM metrology
Verigy V93000 HSM6800 delivers at-speed, high-throughput, automated memory test on ultra-fast GDDR5 graphics memory devices (4Gbps+ per-pin operation). The Korean memory maker selected the V93000 HSM6800 for its test speed headroom
The semiconductor industry is at a crossroads, with new architectures needed to continue scaling both logic and memory devices . In May, Intel surprised many by saying it will switch from a planar to a vertical FinFET transistor at the 22nm
ASA (Thinfilm) and PARC, a Xerox company, entered the next phase of their co-innovation engagement for printed memory devices . This next phase extends the engagement to prototyping the product for manufacturing readiness. PARC and Thinfilm
and metal gate undercuts. Similarly, future 3D memory devices will include multiple gate-level structures defined ..... shape [7]. This is an example of the types of 3D memory devices that will require HVM metrology. Right: Diagram
allow these structures to come to market sooner. Switches based on transition-metal oxides have great potential as memory devices that retain their information even when the power is turned off. One type is made by stacking four different materials
December 20, 2011 -- Cu metallization is now widely used in both logic and memory devices . With the adoption of Cu metallization, metal barriers such as TaN are needed to enhance the adhesion of metal to the dielectric
SEMATECH's authors cover metrology for FinFETs and 3D memory devices , and defect detection capabilities at 22nm. The ..... and metal gate undercuts. Similarly, future 3D memory devices (Part 2 of this series) will include multiple gate