Mask Inspection
Mask Inspection news and technical articles from Solid State Technology Magazine. Search Mask Inspection latest and archived news and articles
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SPIE Advanced Lithography: Intel's, TSMC's tool roadmap takeaways
… company expects the 3300 high-volume scanner to be delivered by the end of CY12. TSMC highlighted source power, mask inspection /mask repair, and mask handling as areas for improvement in EUV technology. Intel plans to move double patterning …
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20nm mask technology relies on SMO and DPT
… even sidewall metrology will become commonplace. Mask inspection will also become more demanding because pattern complexity drives mask inspection time and challenges inspection tool resolution. Improved …
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Frontend process, materials firms get high marks from TSMC
… Research -- Excellent technology development collaboration, etching equipment KLA-Tencor -- Excellent performance, mask inspection equipment SUMCO -- Excellent performance, silicon wafer material BASF -- Excellent technology development collaboration …
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KLAC joins SEMATECH EUV efforts
… SEMI meeting in NY . "KLA Tencor is embarking on an ambitious program to create the next generation of patterned mask inspection using an actinic (i.e. EUV) wavelength of light," said SEMATECH lithography director Bryan Rice, in an additional …
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EUV lithography infrastructure update from SEMATECH
… Consortium (EIDEC) 2013 Mask Defect Review Yes (1 supplier) Funded by SEMATECH EMI Partnership 2014 Patterned Mask Inspection Yes (4 suppliers) Supplier/customer funded 2013-15 SEMATECH EMI initiative was successful in leading the industry …
