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Lithography

Lithography news and technical articles from Solid State Technology Magazine. Search Lithography latest and archived news and articles

  1. Nanotechnology company RMTS relocates to work with CNSE

    Article

    Mon, 27 Jun 2011

    Nanotechnology company RMTS relocated from CO to NY to launch an R&D partnership with CNSE at the University at Albany, developing nano-polarization technologies for displays and windows.

  2. Semiconductor industry executives: Can't miss events at SEMICON West

    Article

    Mon, 27 Jun 2011

    To maintain profitability and growth in the next 10 years, semiconductor executives must understand and successfully execute lab-to-fab transitions of new technologies. 2 SEMICON West sessions aim to tackle these issues.

  1. CEA-Leti Annual Review: The heart of Europe's semiconductor industry challenges

    Article

    Tue, 28 Jun 2011

    At CEA-Leti's Annual Review, Leti CEO Laurent Malier noted how the important role that research and technology organizations should play in strengthening industry in Europe, and how their roles differ from groups in other regions.

  2. CEA-Leti Annual Review: IDMs' top 3 challenges

    Article

    Tue, 28 Jun 2011

    At CEA-Leti's Annual Review, STMicroelectronics CTO Jean-Marc Chery reviewed the challenges facing IDM companies focused on SoC markets, and the three primary challenges for IDMs: FinFETs, EUV lithography, and 450mm.

  3. Extending optical lithography with complementary e-beam lithography

    Article

    Mon, 11 Jul 2011

    David Lam summarizes how the industry does not have to "throw out" optical lithography as it proceeds to more advanced nodes -- complementary e-beam lithography (CEBL) is part of the overall solution, "complementary lithography," that can overcome the resolution limitations of 193i technology.

  4. Suss joins imec's EUV mask integrity work

    Article

    Tue, 12 Jul 2011

    Suss Microtec and imec are expanding a research collaboration in mask cleaning to develop an in-fab approach to EUV lithography mask integrity, aiming to develop a sophisticated approach to preserving mask integrity prior to exposure.

  5. Power management ICs for green energy applications

    Print

    Tue, 12 Jul 2011

    Executive Overview The power management IC (PMIC) has become a critical component in virtually every electronics product today. Much of this demand is being fueled by the global transition to green energy solutions. Highlighted will be a 0.18m BCDMOS process with 30V LDMOS transistors having an Rsp

  6. World News

    Print

    Mon, 11 Jul 2011

    BUSINESS TRENDS VLSI tool champs prove customer service matters VLSI Research's out with its annual "Best supplier" rankings, and there's a tie atop the leaderboard. Nine-time champ Varian Semi. Equip. Assoc. and first-timer Novellus both scored 8.18 in the "large supplier" category of chipmaking

  7. SEMICON West 2011, Day 1: SOI vs. FinFET, ReRAM vs. 3D NAND, and lots of video data

    Article

    Wed, 13 Jul 2011

    The TechXPOT session on Emerging Architectures for Logic and Memory provided a number of interesting perspectives on some of the big transitions in device technologies, which seem to be arriving at an ever-increasing pace, reports Olov Karlsson from Intermolecular.

  8. SEMICON West Day 2: CMP views, outlooks for breakfast

    Article

    Thu, 14 Jul 2011

    Techcet's Michael A. Fury continues his reporting from SEMICON West, reviewing talks at the NCCAVS CMP User Group forum, as well as a breakfast seminar with outlooks on the semiconductor and related industries.

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