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  1. JSR joins lithography research at CEA-Leti

    Article

    Wed, 19 Oct 2011

    October 19, 2011 -- JSR Micro and CEA-Leti will partner to develop sub-20nm next-generation lithography materials and processes , focusing on pitch division in 193nm optical lithography for <20nm logic applications and on direct

  2. SEMATECH adds Inpria resists to EUV lithography work

    Article

    Tue, 24 Apr 2012

    22nm node and beyond This partnership will “rapidly increase the rate of development” for Inpria’s EUV lithography materials , said Andrew Grenville, CEO of Inpria. It will also “help strengthen the RMDC’s ability to address critical

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