Home>Topics>Layer Growth
  1. All
  2. Online Articles
  3. Magazine Articles

Layer Growth

Layer Growth news and technical articles from Solid State Technology Magazine. Search Layer Growth latest and archived news and articles

  1. Crucial applications addressed via fundamental ALD advances

    Magazine Articles

    Tue, 1 Feb 2005

    activation An important factor for the quality of ALD films is the preparation of the surfaces for initiating a continuous layer growth from the outset of ALD cycling. Higher hydroloxilation concentrations (e.g., Si-OH) are desired to obtain continuous

  2. Process technology update: Progress on all fronts

    Magazine Articles

    Mon, 1 Jan 2001

    introduced alternately instead of simultaneously, as in standard CVD processes. This results in the layer-b y- layer growth that creates the characteristics of ALD films, making them appropriate for several applications. An example of the

  3. The detrimental effect of moisture in SiGe epitaxy

    Magazine Articles

    Fri, 1 Mar 2002

    ppb to units of ppm. The wafers were first heated to ~1000°C to remove native oxide from the surface, prior to layer growth in a hydrogen atmosphere, at a reduced pressure (a few torr). The hydrogen used during the bake was the same as

  4. In situ x-ray reflectivity for thin-film deposition monitoring and control

    Magazine Articles

    Sat, 1 May 1999

    of thickness measurements depends on the error in the angle of beam incidence, on the beam divergence, and on the layer growth rate. If the growth rate is not greater than 2-3?/min, then the error in the oscillation period is about a fraction

« Prev12Next »
© 2012. PennWell Corporation. All Rights Reserved. PRIVACY POLICY | TERMS AND CONDITIONS