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Layer Deposition

Layer Deposition news and technical articles from Solid State Technology Magazine. Search Layer Deposition latest and archived news and articles

  1. Silicon nanorod project yields higher efficiency solar cells

    Article

    Tue, 3 Jan 2012

    January 3, 2012 -- Picosun Oy, Finland-based global manufacturer of state-of-the-art Atomic Layer Deposition (ALD) equipment, reports successful final results of the European Union 7th Framework Programme funded research project ROD

  2. ASM covers FinFET precursor needs from epitaxy to HKMG ALD

    Article

    Fri, 22 Jul 2011

    discussed the challenges of making FinFET structures using both epitaxial and high- k /metal gate (HKMG) atomic layer deposition (ALD) processes, speaking with Solid State Technology during SEMICON West 2011 . "With epi, the challenges on

  1. Thin film researchers install Cambridge NanoTech PEALD

    Article

    Tue, 13 Sep 2011

    Cambridge NanoTech Fiji plasma-enhanced atomic layer deposition (PEALD) as part of a partnership with the ALD supplier ..... 4dlabs.ca . Cambridge NanoTech delivers Atomic Layer Deposition (ALD) systems capable of depositing ultra-thin

  2. ALD tool applies self-assembled monolayers for MEMS/NEMS, says Cambridge NanoTech

    Article

    Mon, 27 Jun 2011

    SAMs) capability in its line of Savannah atomic layer deposition (ALD) systems . SAMs coatings are inexpensive and ..... Cambridge, MA. Cambridge NanoTech makes atomic layer deposition (ALD) systems capable of depositing ultra-thin

  3. ALD tool from Lesker suits MEMS, nano fab

    Article

    Thu, 14 Jul 2011

    July 14, 2011 -- Kurt J. Lesker's new Atomic Layer Deposition system, the ALD 150LX, can operate as a stand ..... expandable LVP, HVP precursor delivery suits multiple ALD layer deposition , including metals, oxides and nitride layers

  4. SEMATECH highlights from VLSI-TSA

    Article

    Thu, 26 Apr 2012

    Ge and Si MOSFETs. High-field carrier mobility and MOSFET parameter characteristics were improved by atomic layer deposition (ALD) of a thin beryllium oxide layer to passivate the interface between the Si channel and high-k gate dielectric

  5. Semiconductor wafer fab equipment trends: Deposition

    Article

    Tue, 10 Apr 2012

    flat as a percentage of the overall deposition market. Gains were seen in the “other” portion, namely atomic layer deposition (ALD). ALD is used for the high- k gate dielectric in high- k /metal gate (HKMG) devices. Other as a whole

  6. ALD enables 3D capacitors for CEA-Leti and IPDiA

    Article

    Tue, 10 Apr 2012

    April 10, 2012 -- Research organization CEA-Leti and passive component maker IPDiA developed an atomic layer deposition (ALD) process to apply medium- k dielectric layers on a metal-insulator-metal capacitor architecture, enabling

  7. SAFC Hitech expands LED precursor production in Taiwan

    Article

    Thu, 15 Mar 2012

    production serving high-brightness light-emitting diode (HB-LED) manufacturers. The site will also produce atomic layer deposition (ALD) and chemical vapor deposition (CVD) precursors for silicon semiconductor fabs and offer regional transfilling

  8. Metallization processes for standardized wide-IO memory applications

    Article

    Sun, 1 Jan 2012

    maskless backside isolation (MBI) layer deposition process is achieved, as shown ..... maskless backside isolation layer deposition with wet process. Conclusion ..... insulation/barrier/copper seed layer deposition based on wet electrografting

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