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  1. Printed Electronics 2011: Chips, inks, tissue boxes, and apps in between

    Article

    Wed, 7 Dec 2011

    the functional conducting or semiconducting film. 3 Warren Jackson of HP talked about their R2R self-aligned imprint lithography (SAIL) technique applied to large area metal oxide electronics. The metal oxide systems (In:Ga:Zn and Zn

  2. MOCVD cools down, LED downstream processing heats up

    Article

    Mon, 30 Jan 2012

    size of NPSS substrates. On the other hand, manufacturing cost of NPSS is the same as standard PSS. With nano imprint lithography (NIL) and PHABLE , EVG has two different, cost-efficient technologies implemented in its portfolio. In conclusion

  1. SUSS MicroTec partners for health research

    Article

    Fri, 25 Nov 2011

    to CNH´s recent purchase of a SUSS Mask Aligner, MA/BA8 Gen3 with SCIL option. SCIL (Substrate Conformal Imprint Lithography ) is a technology for large area imprint that enables patterning at nano scale, whilst maintaining consistent

  2. Semiconductor industry expectations for 2012: Take the WWK survey

    Article

    Fri, 17 Feb 2012

    Respondents did not expect to see 193 high-index immersion, direct-write, extreme ultra-violet (EUV), or imprint lithography in production until 2015 or later. Take the 2012 survey: http://www.wwk.com/2012survey.pdf Wright

  3. Robotic die bonder upgrades SET packaging platform

    Article

    Fri, 8 Jul 2011

    force reflow bonding for optoelectronics, RF, and other components and a UV cure for adhesives and UV nano- imprint lithography (UV-NIL). Users can perform fluxless reflow, adhesive joining, thermosonic, thermo-compression and direct

  4. 450mm lithography system order bagged by Molecular Imprints

    Article

    Wed, 16 Nov 2011

    manufacturer. Molecular Imprints will build the 450mm wafer lithography tool on its proprietary Jet and Flash Imprint Lithography (J-FIL) technology, working with high-quality, commercially available imprint masks. The purchase includes

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