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High-K

High-K news and technical articles from Solid State Technology Magazine. Search High-K latest and archived news and articles

  1. IRPS 2013: High-k oxides pose new reliability challenges

    Online Articles

    Tue, 16 Apr 2013

    New finFETs feature high - k dielectrics, which are better than ..... channel region from the gate. Although high - k materials have been in use for five ..... TDDB). "There are two aspects of high k dielectrics that people have to face

  2. High-k semiconductor materials from a chemical manufacturer perspective

    Online Articles

    Mon, 28 Feb 2011

    s standpoint, the development and introduction of high - k layers into the semiconductor industry. Irvine focuses ..... whole and, in particular, the next-generation of high - k and ultra- high - k layers and precursors. Over the last 10 to 15 years

  1. High-k etch performance for next-generation logic gate stacks

    Magazine Articles

    Mon, 1 Dec 2008

    for high-performance metal gate/ high - k devices at 45nm and beyond. Unlike ..... etched in HF solution, wet etching of high - k results in erosion of the nitride cap layer and undesirable high - k profile undercut at the gate. This

  2. Integrating high-k dielectrics: etched polysilicon or metal gates?

    Magazine Articles

    Sun, 1 Jun 2003

    motivation for the introduction of high - k dielectrics predominantly comes from ..... results showed the viability of etching high - k dielectric gate stacks in a single ..... equipment. For rapid introduction of high - k materials into current CMOS platforms

  3. Air Products' high-k materials enable semiconductor advances

    Online Articles

    Thu, 5 Apr 2007

    been made possible through the use of high - k materials in the gate dielectric ..... Products produces and markets a variety of high - k precursors, which are used to deposit ..... atomic layer deposition. The use of high - k dielectrics in conjunction with metal

  4. SEMATECH, IBM: We're using high- k , too

    Online Articles

    Mon, 29 Jan 2007

    uncrated its 45nm transistors using high - k dielectric and metal gates for shipment ..... Toshiba also has led to insertion of high - k metal gates into a manufacturing line ..... Intel, IBM indicated that adding the high - k process to its manufacturing lines

  5. Sub-1nm EOT scaling for high- k /metal-gate stacks

    Magazine Articles

    Thu, 1 Jul 2004

    necessitated the search for a suitable high - k gate dielectric. A material is needed ..... direct tunneling. The implementation of high - k dielectrics to obtain transistors with ..... findings indicate that the HfO 2 -based high - k dielectrics, currently among the leading

  6. TI: We'll use high- k for 45nm after all

    Online Articles

    Wed, 13 Jun 2007

    incorporate a hafnium-based (HfSiON) high - k dielectric material for its future ..... chips. "We're confident that our high - k choice overcomes the technological ..... TI's CTO, in a statement. The high - k dielectric is made by CVD-depositing

  7. IBM: We've made 32nm high- k "gate first" SRAMs

    Online Articles

    Mon, 10 Dec 2007

    it has fabricated 32nm chips using a high - k /metal gate (gate-first) process ..... low-power foundry CMOS technology high - k "gate-first approach, in 32nm ultradense ..... partners say they have incorporated the high - k technology into a new generation of

  8. Intel touts working 45nm chip with high- k , metal gates

    Online Articles

    Mon, 29 Jan 2007

    that incorporate a hafnium-based high - k dielectric material and a new combination ..... including those using SOI." Work on high - k and metal gates (HK+MG) has been ..... the same features, interconnects, high - k features, and design rules as the 45nm

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