High-K news and technical articles from Solid State Technology Magazine. Search High-K latest and archived news and articles
New finFETs feature high - k dielectrics, which are better than ..... channel region from the gate. Although high - k materials have been in use for five ..... TDDB). "There are two aspects of high k dielectrics that people have to face
s standpoint, the development and introduction of high - k layers into the semiconductor industry. Irvine focuses ..... whole and, in particular, the next-generation of high - k and ultra- high - k layers and precursors. Over the last 10 to 15 years
for high-performance metal gate/ high - k devices at 45nm and beyond. Unlike ..... etched in HF solution, wet etching of high - k results in erosion of the nitride cap layer and undesirable high - k profile undercut at the gate. This
motivation for the introduction of high - k dielectrics predominantly comes from ..... results showed the viability of etching high - k dielectric gate stacks in a single ..... equipment. For rapid introduction of high - k materials into current CMOS platforms
been made possible through the use of high - k materials in the gate dielectric ..... Products produces and markets a variety of high - k precursors, which are used to deposit ..... atomic layer deposition. The use of high - k dielectrics in conjunction with metal
uncrated its 45nm transistors using high - k dielectric and metal gates for shipment ..... Toshiba also has led to insertion of high - k metal gates into a manufacturing line ..... Intel, IBM indicated that adding the high - k process to its manufacturing lines
necessitated the search for a suitable high - k gate dielectric. A material is needed ..... direct tunneling. The implementation of high - k dielectrics to obtain transistors with ..... findings indicate that the HfO 2 -based high - k dielectrics, currently among the leading
incorporate a hafnium-based (HfSiON) high - k dielectric material for its future ..... chips. "We're confident that our high - k choice overcomes the technological ..... TI's CTO, in a statement. The high - k dielectric is made by CVD-depositing
it has fabricated 32nm chips using a high - k /metal gate (gate-first) process ..... low-power foundry CMOS technology high - k "gate-first approach, in 32nm ultradense ..... partners say they have incorporated the high - k technology into a new generation of
that incorporate a hafnium-based high - k dielectric material and a new combination ..... including those using SOI." Work on high - k and metal gates (HK+MG) has been ..... the same features, interconnects, high - k features, and design rules as the 45nm