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Hbr news and technical articles from Solid State Technology Magazine. Search Hbr latest and archived news and articles

  1. Predicting plasma in wafer etch and deposition via quantum mechanics

    Article

    Mon, 7 Nov 2011

    silicon dioxide by fluorocarbons, and Ar/ HBr etching in a microwave plasma source. Figure ..... the species are: CF 2 , CF, and F. Ar/ HBr etch process We now consider Si etching performed using Ar/ HBr plasmas. TEL has experimentally determined

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