Extreme Ultraviolet Lithography
Extreme Ultraviolet Lithography news and technical articles from Solid State Technology Magazine. Search Extreme Ultraviolet Lithography latest and archived news and articles
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EUV lithography readiness: ConFab presentation preview
… An Steegan, IMEC; Thomas Jefferson, G450 Consortium; and Naoya Hayashi, Dai Nippon Printing Co. Ltd. Extreme ultraviolet lithography (EUVL) has been in development for about a quarter century and is now getting ready for prime time with …
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Ion beam optimization to reduce EUV mask blank defects
… beam missing the target of the mask blank deposition system. This analysis provides a possible solution. Extreme ultraviolet lithography (EUVL) is currently scheduled for high volume manufacturing starting in 2015. One of the top remaining …
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Major semiconductor makers order EUV lithography metrology tool from Carl Zeiss
April 25, 2012 -- Carl Zeiss Semiconductor Metrology Systems (SMS) Division won orders for its extreme ultraviolet lithography (EUVL) actinic aerial image metrology system, AIMS EUV, from 2 of the 4 members of SEMATECH’s EMI …
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SEMICON West heralds 22nm, EUVL, 450mm, mobile electronics speakers
… development efforts will be discussed in the July 11,10:30am, South Hall TechXPOT session. Learn about extreme ultraviolet lithography (EUVL) readiness from transmission and conversion efficiency to mask and resist work. The session will …
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Tackling EUV lithography shadow distortions with OPC
February 2, 2012 -- Extreme ultraviolet lithography (EUVL) is a leading option for semiconductor technology scaling below 22nm. EUVL adoption depends not only on the instrumentation …
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EUV OPC flow optimization for volume manufacturing
… et al., "Flare mitigation strategies in extreme ultraviolet lithography ," Microelectronic Eng. Vol. 85, Issues ..... 2010. [6] G. F. Lorusso, et al., " Extreme ultraviolet lithography at IMEC: Shadowing compensation and flare …
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SUSS EUV lithography mask management system debuts with imec install
July 13, 2011 -- SUSS MicroTec unveiled MaskTrack Pro InSync, a holistic in-fab extreme ultraviolet lithography (EUVL) mask management product that synchronizes mask cleaning, handling, inspection, and storage. The tasks are performed …
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Improving line roughness by using EUV assist layers
… A. Yu, et al., "Patterning of tailored polycarbonate based non-chemically amplified resists using extreme ultraviolet lithography ," Macromolecular Rapid Comm., 31, pp. 1449-1455 (2010). F.V. Roey, et al., imec: internal …
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SEMICON West 2011: New product roundup
… swiveling articulation on the mounting end. Suss MicroTec The MaskTrack Pro InSync is a holistic in-fab extreme ultraviolet lithography (EUVL) mask management product that synchronizes mask cleaning, handling, inspection, and storage …
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Ushio achieves 30W EUV lithography output
… a presentation in an international conference for EUV lithography -- the 2011 International Symposia on Extreme Ultraviolet Lithography and Lithography Extensions -- held in Miami, FL in late October. Also read: EUV Symposium report card …
