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Etching

Etching news and technical articles from Solid State Technology Magazine. Search Etching latest and archived news and articles

  1. Load-locked etching system

    Magazine Articles

    Mon, 1 Jun 1998

    Load-locked etching system The RIE-200 iP load-locked etching system uses the latest inductively coupled plasma technology to perform high-speed, 0.25-?m etching of the thin films used in ULSI processing. The system

  2. Companies Collaborate for Etching Tool Suite

    Online Articles

    Thu, 27 Jul 2006

    creates plasma process technologies, have released a suite of etching tools specific to MEMS, combining STS and XACTIX products ..... etch systems enable unconventional processes, "such as etching after package insertion and wire-bonding," says David Springer

  3. April 2005 Exclusive Feature: Etch Plasma etching using an ICP etcher

    Online Articles

    Wed, 6 Apr 2005

    Kanagawa, Japan Highly selective SiO 2 etching plasma processes increasingly are required ..... scale integrated circuits, where deep etching of silicon oxide (oxide) layers involves ..... special mechanisms of plasma chemical etching [1-3], it is difficult to etch high

  4. SEERs-based process control and plasma etching

    Magazine Articles

    Tue, 1 Jun 1999

    semiconductor production, particularly in plasma etching . Practical implementation is via self ..... the substrate being etched. In plasma etching , this is important for simultaneous control ..... allows simultaneous determination of an etching plasma`s average electron density

  5. In situ wafer temperature measurement during plasma etching

    Magazine Articles

    Fri, 1 Oct 1999

    one of the hidden parameters in plasma etching that has a significant impact on process ..... Monitoring wafer temperature in plasma etching is a significant challenge, given the ..... chuck (ESC). We studied passivation etching of openings over bonding pads, monitoring

  6. Plasma Etching System

    Magazine Articles

    Sat, 1 Apr 2000

    The PE-2000R roll-to-roll plasma etching system is capable of processing various types of polymeric materials with varying width, thickness and substrate composition

  7. Honeywell buys Unaxis' MEMS etching system

    Online Articles

    Tue, 18 Feb 2003

    Feb. 18, 2003 -- Honeywell International Inc. bought plasma etching equipment for advanced MEMS manufacturing from Unaxis Semiconductors , according to a news release. Honeywell installed Unaxis

  8. Clean cycle prediction in etching processes via direct plasma control

    Magazine Articles

    Thu, 1 Mar 2001

    Systems USA, San Jose, California Gary Skinner, Altis Semiconductor, Essonnes, France overview Plasma processes such as etching are typically controlled with machine parameters, but direct real-time monitoring of the plasma provides added insight and

  9. Nanoplas introduces a new class of dry-etching technology

    Online Articles

    Thu, 14 Mar 2013

    Nanoplas’s new Atomic-Layer Downstream Etching (ALDE) processing allows etching rate and selectivity to be controlled independently ..... Nanoplas’s Atomic-Layer Downstream Etching technology enables a new class of plasma-based

  10. Through-wafer Via Etching

    Magazine Articles

    Fri, 1 Apr 2005

    alternative. Silicon Deep Reactive Ion Etching Given the challenges facing wire bonding ..... wafer vias are micromachined by dry etching , and subsequently filled with metal, they ..... real estate.” Through-wafer plasma etching processes are widely used in mass production

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