Home>Topics>Etching
  1. All
  2. Article
  3. Print
  4. Text

Etching

Etching news and technical articles from Solid State Technology Magazine. Search Etching latest and archived news and articles

  1. The effect of pumping methods on wet etching processes

    Article

    Wed, 4 Apr 2012

    Korea The effect of pumping methods on the etching of PE-TEOS wafers was investigated ..... uniformity, for various pumping methods. Etching is one of the most important processes ..... influence of pumps on the performance of etching processes of wafers. In this present

  2. SINGULUS thin film solar cell tool cleans rear and sides in 1 step

    Article

    Fri, 1 Jul 2011

    hoods and performs pencil and rear side etching with brushes and chemicals. SINGULUS ..... cleaning after oven processes and for etching undesirable coatings off rear side and ..... VITRUM performs glass washing and TCO etching , KCN etching or NH3 treatment. It also

  1. Plasma etch challenges for FinFET transistors

    Article

    Tue, 10 Apr 2012

    that may require new approaches to plasma etching . Compared with planar transistors, the ..... resulting in the need for high-precision etching with minimal — ideally no — structural ..... needs to stop on top of the fin while etching further down to the silicon substrate

  2. Ion beam optimization to reduce EUV mask blank defects

    Article

    Fri, 4 May 2012

    experiments have shown evidence of etching outside the target, we decided to further investigate the beam and this etching . A simple way to measure the beam ..... information about the mechanisms behind the etching , we measured where in the chamber

  3. Predicting plasma in wafer etch and deposition via quantum mechanics

    Article

    Mon, 7 Nov 2011

    rates to be made. The authors discuss the etching of silicon dioxide by fluorocarbons, and Ar/HBr etching in a microwave plasma source. Figure 1. The capacitively coupled plasma (CCP) etching chamber used in this article. Etching

  4. DRIE expands from MEMS to advanced packaging and more applications

    Article

    Tue, 15 May 2012

    May 15, 2012 -- Deep reactive ion etching (DRIE) is a structuring process originally used to make micro electro mechanical systems (MEMS) . This process enables achieving

  5. Defect removal using dry cryogenic aerosols

    Article

    Tue, 3 Apr 2012

    cleans substrates without concern for film etching , material changes, watermarks or electrical ..... without concern for structure damage, film etching , material changes, watermarks or electrical ..... the test level. By avoiding corrosion, etching , and altering surface charge properties

  6. CEA-Leti unveils wide-reaching silicon research scope

    Article

    Wed, 2 May 2012

    addresses deposition ; front side/back side clean , wet etch, and strip; lithography with dual side alignment capability; etching , implant, epitaxy , diffusion; chemical mechanical polishing (CMP) , bonding, grinding, dicing; and advanced in-line

  7. SEMICON West 2011: New product roundup

    Article

    Wed, 27 Jul 2011

    highly scalloped via structures and faster etching times, which provide further cost advantages ..... superior plasma uniformity for ashing, etching , and descum for wafer-level packaging ..... isolators, and retainers) in plasma etching equipment, such as plasma enhanced chemical

  8. Graphene doping doesn't need its own step when done on the edge

    Article

    Mon, 7 Nov 2011

    other fabrication steps such as plasma etching , and that will require us to reinvent the ..... chemical normally used as a resist for etching , then used electron beam lithography ..... treatment could also be applied using plasma etching , Brenner said. Controlling the specific

© 2012. PennWell Corporation. All Rights Reserved. PRIVACY POLICY | TERMS AND CONDITIONS