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October 5, 2011 -- Owens Design Inc., equipment design and build service provider to the solar, semiconductor, and data storage capital equipment markets, launched an automation platform
are published for both mechanical handling wafers (SEMI M74-1108), which are used for R&D and semiconductor equipment design investigation; and single crystal wafers (SEMI M76-0710), which are used for process and metrology equipment
today's sessions. Juan Pablo Trelles discussed fluid-flow effects in ALD, including precursor modifications and equipment design considerations. While Intel has successfully implemented ALD for hafnium oxide deposition, Trelles noted that the
embedded actives and passives -- creates issues up and down the supply chain, affecting assembly processes and equipment , design and simulation tools, reliability methodologies, thermal management strategies and cooling technologies, and