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Dry Etching

Dry Etching news and technical articles from Solid State Technology Magazine. Search Dry Etching latest and archived news and articles

  1. AMEC develops process technology for dry etching at 20nm

    Online Articles

    Wed, 10 Apr 2013

    company is led by a team of semiconductor equipment experts from Silicon Valley and Asia. The extreme challenges of dry etching at 20nm and below has virtually excluded small etch players from the vendor pool, allowing just a few companies to

  2. Nanoplas introduces a new class of dry -etching technology

    Online Articles

    Thu, 14 Mar 2013

    Nanoplas, a global supplier of plasma processing equipment to the semiconductor industry, today announced a new dry-etch process offering virtually unlimited etch selectivity for removing dielectric films on microprocessors and memories at high throughput.

  1. Addressing sidewall roughness using dry etching silicon and SiO 2

    Magazine Articles

    Thu, 1 Jul 2004

    fundamentally improving the inherent roughness of this process [1–3]. We have also characterized various silicon dioxide dry etching processes that provide through-wafer capability at higher etch rates and aspect ratios than previously reported

  2. High-k etch performance for next-generation logic gate stacks

    Magazine Articles

    Mon, 1 Dec 2008

    T. Lill, Applied Materials Dry etching is essential for high-performance ..... gate applications, and explores dry etching options to meet these requirements ..... k etch studies, both wet and dry etching techniques were investigated

  3. Thin, Strong, Cheap

    Magazine Articles

    Fri, 1 Aug 2008

    3D Chip quality by Remote Cold Dry Etching BY PETER HEINZE, PH.D., MARTIN ..... front-side chipping removal by dry etching . 6 The reverse-bending test ..... has been etched by remote cold dry etching . The length of the metal vias can

  4. Controlling contaminants with enhanced gas leak detection

    Magazine Articles

    Sun, 1 Jul 2007

    film deposition, corrosive chlorine (Cl 2 ) for dry - etching , and toxic arsine (AsH 3 ) for ion implantation ..... detects leaking gases from different processes (e.g., dry - etching , CVD, diffusion, and photo). With the assistance of the GLDS, the

  5. Extending process flexibility for single-wafer wet etch

    Magazine Articles

    Sun, 1 Jul 2007

    Despite the success of some dry - etching processes, wet etching remains a staple in semiconductor device fabrication, as well as in many other related technologies

  6. Process and environmental benefits with solvent-free stripping

    Magazine Articles

    Sun, 1 Apr 2001

    11, Austin, Texas Mohamed Boumerzoug, Motorola MOS-12, Phoenix, Arizona overview Photoresist removal following dry etching or high-dose ion implantation conventionally employs solvents and acids, sometimes preceded by a dry oxygen-based

  7. Single-wafer processing is key to MEMS success

    Online Articles

    Wed, 4 Nov 2009

    An important lesson for MEMS devicemakers to learn from the semiconductor industry's improvements in process capabilities to reduce unit production costs, is understanding why single-wafer processing -- specifically, dry etching -- remains the technique of choice for high-throughput, high-yield ...

  8. SAMCO to relocate and expand Silicon Valley office

    Online Articles

    Mon, 22 Apr 2013

    Silicon Valley, a hub of company research centers and ventures. The new laboratory is equipped with SAMCO CVD systems, dry etching systems , cleaning systems, and a suite of thin-film measurement systems. Research will continue on thin films of

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