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  1. AVS Symposium 2011: A pre-show highlight reel

    Article

    Tue, 11 Oct 2011

    packaging for MEMS; Plasma etch challenges (profile control, feature level uniformity, plasma microdamage); a dry etching process for phase-change memory; selective etch processes for magnetic materials (Ni, Co, Ta) High- k dielectrics

  2. IBM, ETH Zurich nanotechnology research center opens -- custom-built for nanoscience research

    Article

    Wed, 18 May 2011

    provides scientists from IBM and ETH Zurich with a flexible environment and tools for lithography, wet processing, dry etching , thermal processes, thin-film deposition or metrology and characterization. The cleanroom also features a special

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