Defect Inspection news and technical articles from Solid State Technology Magazine. Search Defect Inspection latest and archived news and articles
photomasks, has acquired a Lasertec Large Area Mask (LAM) defect inspection tool, and now claims to be the only merchant photomask ..... full-field exposure tools in their bump lines. "This defect inspection tool coupled with our defect repair and metrology tools
that it has acquired a Lasertec Large Area Mask (LAM) defect inspection tool to enhance their full production line for advanced ..... competition in terms of capability and product offering. This defect inspection tool coupled with our defect repair and metrology tools
Defect Inspection System The Surfscan AIT (Advanced Inspection Technology) from Tencor Instruments is a new system for in-line defect inspection of advanced logic and memory devices. According to the company, this system is the first in the
The SurfScan SP2 XP monitor-wafer defect inspection system incorporates upgrades from the original edge-handling version SurfScan SP2 XP , including improved sensitivity to defects
(February 9, 2006) Palo Alto, CA — 1× full-field photomasks supplier Image Technology, a wholly owned subsidiary of SUSS MicroTec, has acquired a Lasertec Large Area Mask (LAM) defect inspection tool to enhance their full production line for advanced 9-in. photomasks.
The NSX-100 is a new addition to the NSX series of automated micro defect inspection systems for wafer and die. It is said to offer an improvement in inspection time of up to 100 percent compared with previous industry
Click here to enlarge image EAGLE is a fully automatic patterned defect inspection system (for 150 to 300mm wafers) that features high-speed automatic die mask design for even the smallest design rules. The
SEMICON West '00 July 17, 2000 Last week KLA-Tencor Corp. unveiled three new defect inspection solutions that the company says upgrades the throughput and detection sensitivity for 0.13 and 0.10 µm production. The eS20XP
either development, ramp-up, or HVM phases.[8] Both defect inspection and review are approaching their fundamental limits, which ..... For the past three years he has been involved in film and defect inspection metrology development. Benjamin Bunday is the project
KLA–Tencor and Applied Materials introduced new mask defect inspection capabilities at Photomask Japan in April: the Applied ..... traditional systems to inspect, leading to desensitized defect inspection criteria or regions labeled “DNI” for “do not