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Cmos Transistors

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  1. Evolution or revolution: the path for metrology beyond the 22nm node

    Article

    Thu, 1 Mar 2012

    measurement challenges of next generation devices. References Doyle, B. et al., "Tri-Gate Fully-Depleted CMOS Transistors : Fabrication, Design and Layout," Symposium on VLSl Technology Digest of Technical Papers, pp. 133-134

  2. Semiconductor metrology beyond 22nm: 3D memory metrology

    Article

    Thu, 16 Feb 2012

    Part 1 on FinFET metrology? Read it here. References [1] Doyle, B. et al., “Tri-Gate Fully-Depleted CMOS Transistors : Fabrication, Design and Layout,” Symposium on VLSl Technology Digest of Technical Papers, pp. 133-134

  1. Semiconductor metrology beyond 22nm: FinFET metrology

    Article

    Thu, 9 Feb 2012

    metrology for 3D memory device architectures. References [1] Doyle, B. et al., “Tri-Gate Fully-Depleted CMOS Transistors : Fabrication, Design and Layout,” Symposium on VLSl Technology Digest of Technical Papers, pp. 133-134

  2. Semiconductor metrology beyond 22nm: Defect inspection and review

    Article

    Thu, 23 Feb 2012

    out: FinFET metrology 3D memory metrology References [1] Doyle, B. et al., “Tri-Gate Fully-Depleted CMOS Transistors : Fabrication, Design and Layout,” Symposium on VLSl Technology Digest of Technical Papers, pp. 133-134

  3. Imec: FinFET beat planar for bigger SRAMs

    Article

    Fri, 17 Jun 2011

    sensitive to device mismatches, which means power needs can be more aggressively scaled. Electrical variations in CMOS transistors are an increasing issue as devices are scaled down, due to random fluctuations in dopant density in the channel

  4. New architectures, litho schemes take the stage at SEMICON West

    Article

    Fri, 24 Jun 2011

    and memories Tuesday, July 12, 10:30-12:30 Three speakers will describe possible successors to today's CMOS transistors . Serge Biesemans, VP of process technology at Imec, will give his thoughts on FinFETs, while Ali Khakifirooz

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