Chemical Deposition
Chemical Deposition news and technical articles from Solid State Technology Magazine. Search Chemical Deposition latest and archived news and articles
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Painting with catalysts: Nano-engineered materials for detoxifying water
… nanostructured metal oxides. In order to achieve the optimal architecture for the product, they employ advanced chemical deposition techniques with a high degree of control over composition and morphology. “Our ultimate goal is to implement …
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Process equipment readiness for through-silicon via technologies
… aspect ratios. Titanium or tantalum barriers and PVD copper seed layers have been co-optimized with electro- chemical deposition to ensure void-free metal fill. For via-last processes, thermal budget becomes a significant concern, since …
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Process equipment readiness for through-silicon via technologies
… aspect ratios. Titanium or tantalum barriers and PVD copper seed layers have been co-optimized with electro- chemical deposition to ensure void-free metal fill. For via-last processes, thermal budget becomes a significant concern, since …
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Exhibitor highlights for Intersolar North America 2010
… is capable of detecting defects in surface quality and chemical deposition of cells at multiple points along a production line ..... bumps and dents; and print/deposition defects such as chemical deposition flaws, stains, spots, watermarks, fingerprints, and …
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New Products
… flexible thin-film PV cells, in surface quality and chemical deposition : topological defects such as scratches, bumps and dents, and print/deposition defects such as chemical deposition flaws, stains, spots, watermarks, fingerprints …
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Technology news
… IITC, June 4-6, San Francisco, CA). Aside from two major presentions-IBM showed rhodium (Rh) electro- chemical deposition (ECD) for ≤32nm contact plugs, and Fujitsu showed nano-clustered silicon (NCS) with low k =2.25 for …
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Copper BEOL solutions for advanced memory
… managing PVD barrier/seed overhang while obtaining sufficient step coverage to ensure good fill during electro- chemical deposition (ECD). Barrier as well as seed overhang must be minimized to maintain margin prior to the ECD fill process. As …
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Downturn meant downshifting to "value engineering alternatives"
… 8 cleanroom; 1,200-square-foot metallo organic chemical deposition (MOCVD) area; and a 220-square-foot chemical bunker ..... Chris Pinzone, Ahura's director of metallo organic chemical deposition (MOCVD), and SMRT Architects (Portland, Maine), made …
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Qcept puts work functions to work locating in-line Cu contamination
… minutes—something that would take an SEM hours to do. "We're quite happy that this tool is able to measure chemical deposition and topographical features on the surface of a wafer, as well as components and laminates," he said. Qcept …
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Jet ECD plating and seed layers for sub-0.10µm Cu interconnects
… Conf. (VMIC), pp. 53-62, 1999. M. Zhu, C.H. Ting, D. Papapanayiotou, "Gap Filling Electro- Chemical Deposition Technology for Copper Damascene Process," 1999 Proc. 16th Int'l VLSI Multilevel Interconn. Conf. (VMIC …
