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Atomic Layer Deposition

Atomic Layer Deposition news and technical articles from Solid State Technology Magazine. Search Atomic Layer Deposition latest and archived news and articles

  1. Thin film researchers install Cambridge NanoTech PEALD

    Article

    Tue, 13 Sep 2011

    install a Cambridge NanoTech Fiji plasma-enhanced atomic layer deposition (PEALD) as part of a partnership with the ALD supplier ..... www.4dlabs.ca . Cambridge NanoTech delivers Atomic Layer Deposition (ALD) systems capable of depositing ultra

  2. ALD tool applies self-assembled monolayers for MEMS/NEMS, says Cambridge NanoTech

    Article

    Mon, 27 Jun 2011

    Monolayers (SAMs) capability in its line of Savannah atomic layer deposition (ALD) systems . SAMs coatings are inexpensive ..... Sonesta in Cambridge, MA. Cambridge NanoTech makes atomic layer deposition (ALD) systems capable of depositing ultra

  1. SEMATECH highlights from VLSI-TSA

    Article

    Thu, 26 Apr 2012

    V, Ge and Si MOSFETs. High-field carrier mobility and MOSFET parameter characteristics were improved by atomic layer deposition (ALD) of a thin beryllium oxide layer to passivate the interface between the Si channel and high-k gate dielectric

  2. Semiconductor wafer fab equipment trends: Deposition

    Article

    Tue, 10 Apr 2012

    roughly flat as a percentage of the overall deposition market. Gains were seen in the “other” portion, namely atomic layer deposition (ALD). ALD is used for the high- k gate dielectric in high- k /metal gate (HKMG) devices. Other as a

  3. ALD enables 3D capacitors for CEA-Leti and IPDiA

    Article

    Tue, 10 Apr 2012

    April 10, 2012 -- Research organization CEA-Leti and passive component maker IPDiA developed an atomic layer deposition (ALD) process to apply medium- k dielectric layers on a metal-insulator-metal capacitor architecture

  4. Copper interconnects: Process integration of iALD TaN

    Article

    Tue, 20 Dec 2011

    Carbonitride Film Deposited with Atomic Layer Deposition Using Ammonia,” J. Electrochem ..... Grown by Plasma-Enhanced Atomic - Layer Deposition ,” J. Vac. Sci. Technol ..... George, “Tantalum Nitride Atomic Layer Deposition Using (tert-Butylimido

  5. SAFC Hitech expands LED precursor production in Taiwan

    Article

    Thu, 15 Mar 2012

    production serving high-brightness light-emitting diode (HB-LED) manufacturers. The site will also produce atomic layer deposition (ALD) and chemical vapor deposition (CVD) precursors for silicon semiconductor fabs and offer regional transfilling

  6. Silicon nanorod project yields higher efficiency solar cells

    Article

    Tue, 3 Jan 2012

    January 3, 2012 -- Picosun Oy, Finland-based global manufacturer of state-of-the-art Atomic Layer Deposition (ALD) equipment, reports successful final results of the European Union 7th Framework Programme funded research project ROD

  7. ASM demonstrates ALD, hafnium high-k metal gate at 14nm

    Article

    Tue, 6 Dec 2011

    1A/cm 2 , on a customer's 14nm R&D semiconductor manufacturing line. Using ASM's most advanced Pulsar atomic layer deposition (ALD) tool, a hafnium-based material with a higher- k value than the current baseline was qualified. The

  8. Picosun ALD achieves record particle levels at Fraunhofer installation

    Article

    Thu, 16 Feb 2012

    70nm) per wafer -- with its PICOSUN P-300B atomic layer deposition (ALD) batch tool installed at Fraunhofer Institute ..... Also read: Picosun launches plasma enhanced atomic layer deposition source View recent issues of the MEMS Direct newsletter

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