Indian River State College in FL will be the first college in the southeastern US to offer students access to the instrumentation and curriculum provided by the NanoProfessor Nanoscience Education Program from NanoInk.

Stefan Wurm, director of lithography, SEMATECH will present “EUV Lithography Manufacturing Introduction: Infrastructure Readiness” in the session Technology Trends in Semiconductor Manufacturing at The ConFab 2012, June 3-6 in Las Vegas.

A number of techniques have been developed to control mask write time by reducing shot count. This article describes  and compares several techniques, and merits versus cost of each. Steffen Schulze and Tim Lin, Mentor Graphics, Wilsonville, OR

Gigaphoton Inc., lithography light source manufacturer, began operations at its wholly owned subsidiary, Gigaphoton Korea Inc. Gigaphoton points to Korea as “one of the most important regions in the global semiconductor industry.”

SENSIRION introduced the SLQ-QT105 semiconductor-grade flow sensor for flow rates below 2cc/sec (120ml/min) of hydrocarbon-based liquids, such as photoresists and solvents.

Arkema and CEA-Leti, with the help of Professor Hadziioannou’s team of LCPO, have successfully patterned a 20nm pitch and reduced the diameter of contacts down to 7nm with nanostructured polymers.

President Barack Obama toured the SUNY - Albany Nano-Tech Complex today, speaking about the economy and education in the CNSE NanoFab Extension Building.

The lithography challenges  associated with TSV fabrication for various devices structures are investigated. Warren W. Flack, Manish Ranjan, Gareth Kenyon, Robert Hsieh, Ultratech, Inc., San Jose, CA. John Slabbekoorn, Andy Miller, imec, Leuven, Belgium

The Heterogeneous Technology Alliance in Europe is focusing on high-performance organic electronic circuits through 2 projects: COSMIC to develop p- and n-type OTFTs for complementary logic, and POLARIC for shrinking critical dimensions of OTFTs.

A likely cause of many of the defects seen on EUV mask blanks is the ion beam missing the target of the mask blank deposition system. This analysis provides a possible solution. Patrick Kearney and Frank Goodwin, SEMATECH, Albany, NY

CEA-Leti has introduced the “LETI-3S” concept, for “Silicon Specialty Solutions.” The research is oriented to start-ups, component integrators, fabless or fablite chip companies, and equipment/consumable suppliers.

Solid State Technology and SEMI will present the 2012 Best of West product awards at SEMICON West 2012, July 10-12 in San Francisco. Best of West recognizes important product and technology developments in the microelectronics industries.

CEA will extend its collaboration with Arkema beyond photovoltaics into microelectronics and organic electronics, setting up two joint public-private research projects in CEA-Leti and CEA-Liten.

I recently had the good fortune to moderate the SEMI Northeast Forum on 450mm in Albany.