LITHOGRAPHY

MAGAZINE

05/03/2012
Volume 55, Issue 4

LITHOGRAPHY ARTICLES

North American semiconductor tool makers see higher bookings in April

05/23/2012 North America-based manufacturers of semiconductor fab equipment posted $1.60 billion in orders and $1.45 billion in billings in April 2012 for a b...

IRSC brings NanoProfessor nano-science education to southeastern US

05/22/2012 Indian River State College in FL will be the first college in the southeastern US to offer students access to the instrumentation and curriculum pr...

EUV lithography readiness: ConFab presentation preview

05/21/2012 Stefan Wurm, director of lithography, SEMATECH will present “EUV Lithography Manufacturing Introduction: Infrastructure Readiness” in the session T...

Reducing mask write-time -- which strategy is best?

05/17/2012 A number of techniques have been developed to control mask write time by reducing shot count. This article describes  and compares several tec...

SEMICONDUCTOR INDUSTRY NEWS

EpiGaN opens GaN-on-Si wafer production at new site

May 23, 2012

EpiGaN NV opened its GaN epitaxial material production site, on the Research Campus Hasselt in Belgium. EpiGaN’s GaN-on-Si material is used in next-generation power electronics.

Direct chip bonding, all-SiC design increase power density in Mitsubishi Electric inverter

May 23, 2012 Mitsubishi Electric Corporation developed a prototype forced-air-cooled three-phase 400V output inverter with all-silicon carbide (SiC) power modules and direct lead bonding that has a power densit...

CMP carrier upgrades legacy fab tools

May 23, 2012

Axus Technology introduced the Titan Carrier Upgrade for IPEC and Strasbaugh legacy CMP chemical mechanical polishing/planarization (CMP) tools for semiconductor and related manufacturing.

Figure. Three new mechanisms at the nanoscale. A computer-model image of an island of metal atoms formed after bombardment by noble gas ions. Atoms disturbed by the bombardment cluster together under the surface and then glide back up in a matter of 2.1ps. SOURCE: Kim Lab/Brown University.

Researchers model ion bombardment for better nanofabrication

May 22, 2012

Brown University is using supercomputer simulations to better understand the ion bombardment of metal surfaces used in manufacturing nanoelectronics.

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