Ampt optimizes PV modules with junction box suppliers' help
11/08/2011
Ampt announced partnerships with Amphenol, Huber+Suhner, Multi-Contact, and Shoals Technologies Group to bring the company's DC/DC PV-module-level ...
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Heraeus nods to PV cost pressures with lower-silver pastes
10/19/2011
Heraeus has introduced new silver pastes for thin-film and crystalline solar cell fabrication, focusing on lower silver content. Andy London of Her...
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Canadian Solar makes a play for re-engineering solar economics
10/12/2011
Alan King, Canadian Solar, discusses the design rules for Intelligrated Power PV panels, debuting at Solar Power International. King also comments ...
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Azuray PV power optimizers target shading
10/11/2011
Azuray Technologies is launching two solar power optimizers at Solar Power International: the AP260 DC-DC power optimizer and the AC160 solar modul...
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DuPont MCM on lower-silver PV metallization pastes
10/04/2011
Peter Brenner, global marketing manager, photovoltaics, at DuPont MCM, speaks about DuPont?s new lower-silver Solamet metallization pastes. |
Ziptronix low-temp direct oxide bonding scales pixels to 0.7µm width
09/27/2011
In a podcast interview with ElectroIQ.com, Ziptronix president & CEO, Daniel Donabedian, and company CTO, Paul Enquist, discussed both the Zipt...
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Advanced Energy demos SEGIS technology: high-penetration PV on the grid
09/26/2011
After a demonstration of Solar Energy Grid Integration System (SEGIS) technology by Advanced Energy Industries Inc. (Nasdaq:AEIS), Michael Mills-Pr...
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D2S doubles down with new mask-wafer double simulation workstation
09/20/2011
D2S announced a mask-wafer double simulation accelerated workstation for R&D exploration, bit-cell design, hot-spot analysis and mask defect ca...
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IC Insights updates semi forecast, discusses China's stimulus success
09/20/2011
IC Insights' Bill McClean discusses his fall forecast update for the semiconductor industry, why he sees 8%-9% long-term growth, and the impact of ...
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Applied unveils EUVL mask etch system
09/19/2011
Amitabh Sabharwal, GM, mask etch products, at Applied Materials, talks about AMAT's new EUV lithography reticle etch system. |