Freeman, Gartner, says 193i stepper will be a barnburner for 2011 capex
01/19/2011
Dean Freeman, research VP at Gartner, summarizes key elements of his industry forecast -- which he presented to attendees of SEMI's Industry Strate...
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Armbrust, SEMATECH, speaks on the role of governments in R&D funding
01/19/2011
Significant technology transitions facing the semiconductor industry include lithography (introduction of EUV), interconnects (TSVs and 3D packagin...
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Micron on M&A strategy, enthusiasm for memory
01/17/2011
Mark Durcan, president & COO of Micron, gave the conference keynote address at SEMI’s Industry Strategy Symposium (ISS, 1/9-1/12/11, Half Moon ...
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Raaijmakers, ASM, on not-so-conventional spacers, new channel materials
01/13/2011
ASM CTO Ivo Raaijmakers notes that semiconductor fab below 22nm will require different processes for spacers: atomic layer deposition (ALD) and pla...
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Wilk, ASM, on materials modification to extend scaling 1-2 gens past 22nm
01/10/2011
During IEDM 2010 (12/6-12/8/10, San Francisco, CA), Debra Vogler, senior technical editor, had the opportunity to discuss scaling strategies with G...
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Leti researchers advance FDSOI at IEDM
01/10/2011
At the recent IEDM 2010 conference (12/6-12/8/10), Leti's Olivier Faynot, Innovative Devices Laboratory leader, discusses invited paper #3.2 ("...
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Laurent Clavelier, Leti, talks Moore's Law
01/03/2011
The semiconductor industry’s ongoing discussion of "more Moore" and "more than Moore" at IEEE’s IEDM 2010 (12/6-12/8/10, San Fr...
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Jammy, SEMATECH, on prepping for FinFET scaling
12/21/2010
To prepare for the time when the semiconductor industry might choose FinFETs at advanced nodes, SEMATECH researchers investigated possible scalabil...
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Demonstrating RRAM viability: Imec?s Hoffman talks at IEDM
12/20/2010
Imec researchers demonstrated the competition effect in the switching of several conductive filaments in resistive RAM (RRAM) using a small-size FU...
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SEMATECH on dielectric dipole-mitigated Schottky barrier height tuning
12/16/2010
Raj Jammy, VP, materials & emerging technologies at SEMATECH, explains the details behind the work done on paper #26.3 (“Contact resistance red...
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