Novellus Systems (NASDAQ: NVLS) created an advanced copper barrier-seed physical vapor deposition (PVD) process for the emerging through-silicon-via (TSV) packaging market. The process uses Novellus’ established INOVA platform with patented hollow cathode magnetron (HCM) technology to produce highly conformal copper seed films that are reportedly four times thinner than the conventional PVD seed approaches used for TSV applications. Novellus announced that the HCM TSV process delivers excellent sidewall and bottom coverage, and enables void-free copper fill during the subsequent TSV electroplating step.
Allvia says it has integrated embedded capacitors on silicon interposers, a key interface between silicon devices and organic substrates, achieving >1500nF/cm2 capacitance.
In a deal that will generate economical new process options for the 3D integration market, Alchimer S.A., a provider of nanometric deposition technology for semiconductor interconnects and through-silicon vias (TSV), and KPM Tech Co. Ltd., a manufacturer of plating materials and systems, announced a multi-level collaboration that gives KPM Tech exclusive rights to produce chemicals in Korea for Alchimer’s technology. The agreement also includes the manufacture of various configurations of wet processing tools to support the Alchimer TSV platform.
Allvia says it has completed integration and full reliability testing of a silicon interposer between a semiconductor die and an organic or ceramic substrate.
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