Controlling molecular contaminants at 32nm, 22nm - Solid State Technology
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Controlling molecular contaminants at 32nm, 22nm



Jim Ohlsen, director of materials characterization at Entegris, discusses methods to improve yield at 32nm by controlling molecular contaminants in microenvironments. He also describes the multiple solutions that will be needed at 22nm to keep molecular contaminants at very low levels for long periods of time.

 

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