STM completes 20nm chip tapeout with MENT design tools
November 7, 2011
Mentor Graphics Corporation (NASDAQ:MENT) completed a 20nm test chip tapeout with STMicroelectronics (NYSE:STM), overcoming low-power and double-patterning challenges. |
Creating phase-change memory devices with GeTe thin films
November 1, 2011
GeTe deposition can be a productive process in applications such as PCM devices where the ability to fill small structures is mandatory. |
The era of fully-depleted devices
November 1, 2011
Planar FDSOI devices can be used to improve the short channel effect when scaling down to 11nm and have a much simpler integration scheme compared to alternatives. |
LEDs get efficiency boost from ZnO microwires
October 31, 2011
Georgia Tech researchers have found that GaN LEDs get a significant efficiency boost from zinc oxide microwires. The piezo-phototronic effect charges LEDs' ability to convert electricity to UV ligh...
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EUV Symposium report card: EUV's past, present, and future
October 28, 2011
Two Wall Street analysts report their impressions from last week's EUV Symposium (Oct. 17-19 in Miami), where companies in the EUV supply chain reported their latest results and planned progress th...
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Surface Cleaning and Preparation
This introduction requires the development of new critical and selective cleans tackling galvanic corrosion, pattern collapse both in FEOL and BEOL...
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450mm Status Report
Hear from the G450C General Manager, Paul Farrar Jr., on the current status of activities, key milestones and schedules, and imec’s senior business...
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Innovation in Semiconductor Manufacturing Instrumentation
As the semiconductor industry moves toward smaller geometries, manufacturing processes are becoming more complex. In particular, they’re more deman...
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