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STM completes 20nm chip tapeout with MENT design tools

November 7, 2011

Mentor Graphics Corporation (NASDAQ:MENT) completed a 20nm test chip tapeout with STMicroelectronics (NYSE:STM), overcoming low-power and double-patterning challenges.

Creating phase-change memory devices with GeTe thin films

November 1, 2011

GeTe deposition can be a productive process in applications such as PCM devices where the ability to fill small structures is mandatory.

The era of fully-depleted devices

November 1, 2011

Planar FDSOI devices can be used to improve the short channel effect when scaling down to 11nm and have a much simpler integration scheme compared to alternatives.

LEDs get efficiency boost from ZnO microwires

October 31, 2011 Georgia Tech researchers have found that GaN LEDs get a significant efficiency boost from zinc oxide microwires. The piezo-phototronic effect charges LEDs' ability to convert electricity to UV ligh...

EUV Symposium report card: EUV's past, present, and future

October 28, 2011 Two Wall Street analysts report their impressions from last week's EUV Symposium (Oct. 17-19 in Miami), where companies in the EUV supply chain reported their latest results and planned progress th...

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Surface Cleaning and Preparation

This introduction requires the development of new critical and selective cleans tackling galvanic corrosion, pattern collapse both in FEOL and BEOL...

450mm Status Report

Hear from the G450C General Manager, Paul Farrar Jr., on the current status of activities, key milestones and schedules, and imec’s senior business...
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Innovation in Semiconductor Manufacturing Instrumentation

As the semiconductor industry moves toward smaller geometries, manufacturing processes are becoming more complex. In particular, they’re more deman...
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