Sony’s PS Vita Uses Chip-on-Chip SiP – 3D, but not 3D

By Dick James
At the tail end of last year Sony released their PlayStation Vita , and it was duly torn down by iFixit and others. In due course we took it apart too, though we didn’t post it on our teardown blog .

Sony CXD5315GG in the PlaySation Vita
Inside we found the usual set of wireless chips, motion sensors, and memory, but the key to the increased performance of the PS Vita is the Sony CXD5315GG processor, a quad-core ARM Cortex-A9 device with an embedded Imagination SGX543MP4+ quad-core GPU.

Above I said that we found memory, but actually the only discrete memory that we found on the motherboard was 4 GB of Toshiba flash; and Sony’s specification states that there is 512 MB (4 Gb) regular RAM, plus 128 MB (1 Gb) VRAM (video RAM). In a phone that would tell me that there is memory in a package-on-package (PoP) configuration, mobile SDRAM in the top part and the processor in the bottom part.

However, when we took the part off the board and did a set of x-rays, the side view proved me wrong – it’s a stack, and the close-up shows that there appear to be five dies in there, a thick die at the base, a thinner one immediately on top and three smaller die on top of that. The second die down could be a spacer, since there don’t seem to bond wires going to it.
Side x-ray images of Sony CXD5315GG
This immediately led us to speculate – if the second die up is the VRAM, is it wide I/O DRAM, and is it using through-silicon vias (TSVs)? Time for a real cross-section to check that out, and almost predictably we were disappointed:

Sony CXD5315GG package cross-sectioned
This type of face-to-face connection showed up back in 2006 in the original Sony PSP, and Toshiba had dubbed it “semi-embedded DRAM”, now they are calling it “Stacked Chip SoC”. The ball pitch is an impressive ~45 µm, almost as tight as TI’s copper pillars, but they are staggered to achieve 40-µm pitch.

So what are the five chips that are in the stack? At the base we have the processor chip; face to face with it is a Samsung 1-Gb wide I/O SDRAM; and the top three dies comprise two Samsung 2-Gb mobile DDR2 SDRAMs, separated by a spacer die, and conventionally wire-bonded. The base die is ~250 µm thick, and the others ~100 – 120 µm.

When we look at the die photos of the processor and the 1-Gb memory, we can see that they are purposely laid out for the stacked-chip configuration, since in the centres of both is an array of matching bond pads.

Die photos of the Sony CXD5315GG (left) and Samsung 1-Gb wide I/O SDRAM with bond pad arrays annotated
Close examination reveals that there are 1080 pads in two blocks of 540 (2 sub-blocks of 45 rows of 6 pads), so likely 2 x 512 bit I/O operation, possibly sub-divided into 4 x 128.

Wide I/O bond pad arrays in Sony CXD5315GG (top) and Samsung SDRAM
Last year at ISSCC Samsung described a similar wide I/O DRAM using TSVs [1], claiming a data bandwidth of 12.8 Gb/s, four times the bandwidth of an equivalent LPDDR2 part. I doubt that the authors expected their design to be in a volume consumer device before the end of the year, but that seems to be what happened!

Chip architecture of Samsung 1Gb Wide-I/O DRAM and SEM image of microbumps (Source: Samsung/ISSCC)
This uses similar I/Os, but not the same as, the JEDEC wide I/O standard issued earlier this year (which calls for 50 rows of 6 pads in each block), and of course it predates it by about a year.

By combining the processor with the different memories in the same package in the Vita, Sony and Toshiba have produced one of the few true system-in-package (SiP) parts that we have seen. And I would call it 3D, even though industry convention is now restricting that term to TSV-based parts – so it’s not 3D, in our current argot.

In a way this device highlights the commercial barriers to introducing TSVs into the SiP world, since not only do the corresponding parts have to be designed to suit the I/Os, but at least for a two-stack the technology is already there; so the performance cost/benefit has to be critical enough to require TSVs for that third and more die. Admittedly the demands on mobile devices are increasing at an astounding pace, but it still seems a while before we’ll see TSVs in commercial devices. Time will tell!

[1] J-S. Kim et al., A 1.2V 12.8GB/s 2Gb Mobile Wide-I/O DRAM with 4×128 I/Os Using TSV-Based Stacking, ISSCC 2011, pp. 496 – 498.

DickJames100x100

DICK JAMES is a 40-year veteran of the semiconductor industry and the senior technology analyst for Chipworks, an Ottawa, Canada-based specialty reverse engineering company. Chipworks analyses a broad range of devices, giving Dick a unique overview of what technologies make it into the real world of semiconductor production.

Previous Posts

Intel Foundries MEMS for Fuel Cell Start-up Nectar

Wed Jan 30 14:40:00 CST 2013

IBM surprises with 22nm details at IEDM

Wed Dec 12 04:00:00 CST 2012

Intel details 22nm trigate SoC process at IEDM

Tue Dec 11 12:23:00 CST 2012

GlobalFoundries takes on Intel with 14nm finFET “eXtreme Mobility” process

Tue Oct 02 16:22:00 CDT 2012

The Elephant Has Left the Room – 450 mm is a Go!

Tue Jul 10 09:35:00 CDT 2012

Sony’s PS Vita Uses Chip-on-Chip SiP – 3D, but not 3D

Fri Jul 06 09:34:00 CDT 2012

Intel’s 22-nm Trigate Transistors Exposed

Tue Apr 24 11:39:00 CDT 2012

Intel to Present on 22-nm Tri-gate Technology at VLSI Symposium

Thu Apr 12 12:21:00 CDT 2012

Dialog Semi Gets the Girls for Apple

Mon Apr 02 16:00:00 CDT 2012

Semicon China – SMIC Shows off 28-nm HKMG Development

Tue Mar 20 09:09:00 CDT 2012

GloFo’s FinFETS are Better than Intel's! Musings from CPTF

Sun Mar 18 09:58:00 CDT 2012

GlobalFoundries' Ajit Manocha Visits CES

Tue Jan 17 12:41:00 CST 2012

Intel Press Briefing and Keynote at CES 2012

Fri Jan 13 14:17:00 CST 2012

TI Debuts 28-nm OMAP 5 Processor at CES

Wed Jan 11 15:12:00 CST 2012

IEDM 2011: IBM displays via-middle TSV process for die stacking

Wed Dec 07 05:57:00 CST 2011

© 2013. PennWell Corporation. All Rights Reserved. PRIVACY POLICY | TERMS AND CONDITIONS